Inventor · disambiguated record
Kazumi Noda
Also filed as: NODA KAZUMI
27 granted patents·4 pending applications·106 citations·filing 1996–2020
95Inventor score
Top patents by PatentIndex Score
31 records- 0188US9372404B2Organic film composition, method for forming organic film and patterning process using this, and heat-decomposable polymerSHINETSU CHEMICAL CO·Filed 2013·Granted Jun 21, 2016·8 cites·27 claims
- 0287US9728420B2Organic film composition, process for forming organic film, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 8, 2017·5 cites·15 claims
- 0387US7261995B2Nitrogen-containing organic compound, chemically amplified resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Aug 28, 2007·9 cites·4 claims
- 0484US9977330B2Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted May 22, 2018·3 cites·24 claims
- 0578US7687228B2Antireflection film composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2008·Granted Mar 30, 2010·4 cites·24 claims
- 0677US8288072B2Resist lower layer film-formed substrateHATAKEYAMA JUN·Filed 2008·Granted Oct 16, 2012·4 cites·8 claims
- 0776US7745094B2Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Jun 29, 2010·4 cites·8 claims
- 0875US9261788B2Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Feb 16, 2016·2 cites·1 claims
- 0975US8129100B2Double patterning processTAKEMURA KATSUYA·Filed 2009·Granted Mar 6, 2012·4 cites·14 claims
- 1074US9046764B2Resist underlayer film composition, method for producing polymer for resist underlayer film, and patterning process using the resist underlayer film compositionSHINETSU CHEMICAL CO·Filed 2012·Granted Jun 2, 2015·2 cites·24 claims
- 1174US7879530B2Antireflective coating composition, antireflective coating, and patterning processSHINETSU CHEMICAL CO·Filed 2008·Granted Feb 1, 2011·2 cites·6 claims
- 1272US11018015B2Composition for forming organic film, substrate for manufacturing semiconductor device, method for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 25, 2021·1 cites·22 claims
- 1372US8323536B2Near-infrared absorbing dye, near-infrared absorptive film-forming composition, and near-infrared absorptive filmOHASHI MASAKI·Filed 2011·Granted Dec 4, 2012·1 cites·8 claims
- 1467US7276324B2Nitrogen-containing organic compound, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2004·Granted Oct 2, 2007·8 cites·12 claims
- 1558US7651829B2Positive resist material and pattern formation method using the sameSHINETSU CHEMICAL CO·Filed 2004·Granted Jan 26, 2010·9 cites·8 claims
- 1658US6558867B2Lift-off resist compositionsSHINETSU CHEMICAL CO·Filed 2001·Granted May 6, 2003·5 cites·19 claims
- 1757US6899991B2Photo-curable resin composition, patterning process, and substrate protecting filmSHINETSU CHEMICAL CO·Filed 2002·Granted May 31, 2005·13 cites·6 claims
- 1857US5905139APurification of polysilaneSHINETSU CHEMICAL CO·Filed 1997·Granted May 18, 1999·13 cites·17 claims
- 1956US10007183B2Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Jun 26, 2018·0 cites·28 claims
- 2053US7510816B2Silicon-containing resist composition and patterning processSHIN ESTU CHEMICAL CO LTD·Filed 2005·Granted Mar 31, 2009·4 cites·6 claims
- 2150US5748292ACoupling mechanism for use in a semi-openable document presser of an image forming apparatusMITA INDUSTRIAL CO LTD·Filed 1996·Granted May 5, 1998·4 cites·13 claims
- 2246US12215221B2Material for forming organic film, method for forming organic film, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 4, 2025·0 cites·18 claims
- 2345US2007190458A1Resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 2444US8313890B2Antireflective coating composition, antireflective coating, and patterning processTACHIBANA SEIICHIRO·Filed 2009·Granted Nov 20, 2012·0 cites·11 claims
- 2542US9069245B2Near-infrared absorptive layer-forming composition and multilayer filmOHASHI MASAKI·Filed 2011·Granted Jun 30, 2015·0 cites·15 claims
- 2642US7550247B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2005·Granted Jun 23, 2009·1 cites·8 claims
- 2741US8153836B2Silsesquioxane compound mixture, hydrolyzable silane compound, making methods, resist composition, patterning process, and substrate processingNAKASHIMA MUTSUO·Filed 2007·Granted Apr 10, 2012·0 cites·1 claims
- 2841US2013157463A1Near-infrared absorbing film composition for lithographic applicationGOLDFARB DARIO L·Filed 2011·Application pending·0 cites
- 2940US2005079443A1Radiation-sensitive polymer composition and pattern forming method using the sameSHINETSU CHEMICAL CO·Filed 2004·Application pending·0 cites
- 3036US8722307B2Near-infrared absorptive layer-forming composition and multilayer film comprising near-infrared absorptive layerTACHIBANA SEIICHIRO·Filed 2011·Granted May 13, 2014·0 cites·23 claims
- 3134US2011262863A1Near-infrared absorptive layer-forming composition and multilayer filmTACHIBANA SEIICHIRO·Filed 2011·Application pending·0 cites
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