Inventor · disambiguated record
Chung-Shih Pan
Also filed as: PAN CHUNG-SHIH
20 granted patents·1 pending application·459 citations·filing 1994–2020
93Inventor score
Files withHERMES MICROVISION INC11WANG YOU-JIN4ASML NETHERLANDS BV2HERMES MICROVISION TAIWAN INC1JAU JACK1
Top patents by PatentIndex Score
21 records- 0195US5502306AElectron beam inspection system and methodKLA INSTR CORP·Filed 1994·Granted Mar 26, 1996·400 cites·35 claims
- 0292US8575573B2Structure for discharging extreme ultraviolet maskWANG YOU-JIN·Filed 2011·Granted Nov 5, 2013·14 cites·7 claims
- 0390US9113538B2Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet maskHERMES MICROVISION INC·Filed 2013·Granted Aug 18, 2015·9 cites·6 claims
- 0487US10054556B2Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet maskHERMES MICROVISION INC·Filed 2016·Granted Aug 21, 2018·3 cites·17 claims
- 0586US10088438B2Method and system for inspecting an EUV maskHERMES MICROVISION INC·Filed 2016·Granted Oct 2, 2018·2 cites·13 claims
- 0684US10775325B2Method and system for inspecting an EUV maskASML NETHERLANDS BV·Filed 2018·Granted Sep 15, 2020·2 cites·9 claims
- 0780US9572237B2Structure electron beam inspection system for inspecting extreme ultraviolet mask and structure for discharging extreme ultraviolet maskHERMES MICROVISION INC·Filed 2015·Granted Feb 14, 2017·2 cites·17 claims
- 0879US8094924B2E-beam defect review systemJAU JACK·Filed 2008·Granted Jan 10, 2012·8 cites·5 claims
- 0973US9164399B2Reticle operation systemHERMES MICROVISION INC·Filed 2013·Granted Oct 20, 2015·2 cites·7 claims
- 1072US11662323B2Method and system for inspecting an EUV maskASML NETHERLANDS BV·Filed 2020·Granted May 30, 2023·0 cites·15 claims
- 1171US6791095B2Method and system of using a scanning electron microscope in semiconductor wafer inspection with Z-stage focusHERMES MICROVISION TAIWAN INC·Filed 2002·Granted Sep 14, 2004·10 cites·23 claims
- 1270US9485846B2Method and system for inspecting an EUV maskHERMES MICROVISION INC·Filed 2014·Granted Nov 1, 2016·1 cites·4 claims
- 1370US8604428B2Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging systemWANG YOU-JIN·Filed 2011·Granted Dec 10, 2013·2 cites·17 claims
- 1470US8110818B2Method of controlling particle absorption on a wafer sample being inspected by a charged particle beam imaging systemWANG YOU-JIN·Filed 2008·Granted Feb 7, 2012·3 cites·19 claims
- 1565US9859089B2Method and system for inspecting and grounding an EUV maskHERMES MICROVISION INC·Filed 2015·Granted Jan 2, 2018·1 cites·7 claims
- 1661US8031344B2Z-stage configuration and application thereofHERMES MICROVISION INC·Filed 2009·Granted Oct 4, 2011·0 cites·20 claims
- 1754US9460887B2Discharging method for charged particle beam imagingWANG YOU-JIN·Filed 2009·Granted Oct 4, 2016·0 cites·20 claims
- 1852US7838848B2Patterning device holding apparatus and application thereofHERMES MICROVISION INC·Filed 2008·Granted Nov 23, 2010·0 cites·20 claims
- 1950US8519333B2Charged particle system for reticle/wafer defects inspection and reviewKUAN CHIYAN·Filed 2012·Granted Aug 27, 2013·0 cites·22 claims
- 2048US2009121159A1Cluster e-beam lithography systemHERMES MICROVISION INC·Filed 2008·Application pending·0 cites
- 2145US7868303B2Method and handling apparatus for placing patterning device on support member for charged particle beam imagingHERMES MICROVISION INC·Filed 2008·Granted Jan 11, 2011·0 cites·24 claims
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