Inventor · disambiguated record
Rong-Wu Chien
Also filed as: CHIEN RONG-WU
13 granted patents·510 citations·filing 1996–1999
93Inventor score
Files withVANGUARD INT SEMICONDUCT CORP13
Top patents by PatentIndex Score
13 records- 0194US5895740AMethod of forming contact holes of reduced dimensions by using in-situ formed polymeric sidewall spacersVANGUARD INT SEMICONDUCT CORP·Filed 1996·Granted Apr 20, 1999·176 cites·20 claims
- 0284US5686337AMethod for fabricating stacked capacitors in a DRAM cellVANGUARD INT SEMICONDUCT CORP·Filed 1996·Granted Nov 11, 1997·54 cites·29 claims
- 0383US5904154AMethod for removing fluorinated photoresist layers from semiconductor substratesVANGUARD INT SEMICONDUCT CORP·Filed 1997·Granted May 18, 1999·82 cites·18 claims
- 0475US5869383AHigh contrast, low noise alignment mark for laser trimming of redundant memory arraysVANGUARD INT SEMICONDUCT CORP·Filed 1997·Granted Feb 9, 1999·43 cites·7 claims
- 0567US6168987B1Method for fabricating crown-shaped capacitor structuresVANGUARD INT SEMICONDUCT CORP·Filed 1996·Granted Jan 2, 2001·27 cites·11 claims
- 0666US6010942APost chemical mechanical polishing, clean procedure, used for fabrication of a crown shaped capacitor structureVANGUARD INT SEMICONDUCT CORP·Filed 1999·Granted Jan 4, 2000·40 cites·16 claims
- 0764US5702869ASoft ashing method for removing fluorinated photoresists layers from semiconductor substratesVANGUARD INT SEMICONDUCT CORP·Filed 1996·Granted Dec 30, 1997·30 cites·24 claims
- 0853US5643824AMethod of forming nitride sidewalls having spacer feet in a locos processVANGUARD INT SEMICONDUCT CORP·Filed 1996·Granted Jul 1, 1997·20 cites·34 claims
- 0949US6136688AHigh stress oxide to eliminate BPSG/SiN crackingVANGUARD INT SEMICONDUCT CORP·Filed 1999·Granted Oct 24, 2000·16 cites·25 claims
- 1045US6307273B1High contrast, low noise alignment mark for laser trimming of redundant memory arraysVANGUARD INT SEMICONDUCT CORP·Filed 1996·Granted Oct 23, 2001·11 cites·22 claims
- 1143US5597764AMethod of contact formation and planarization for semiconductor processesVANGUARD INT SEMICONDUCT CORP·Filed 1996·Granted Jan 28, 1997·11 cites·25 claims
- 1229US6043160AMethod of manufacturing a monitor pad for chemical mechanical polishing planarizationVANGUARD INT SEMICONDUCT CORP·Filed 1998·Granted Mar 28, 2000·0 cites·16 claims
- 1323US6204195B1Method to prevent CMP overpolishVANGUARD INT SEMICONDUCT CORP·Filed 1998·Granted Mar 20, 2001·0 cites·20 claims
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