Inventor · disambiguated record
Akira Koshiishi
Also filed as: KOSHIISHI AKIRA
65 granted patents·18 pending applications·2,882 citations·filing 1990–2022
99Inventor score
Files withTOKYO ELECTRON LTD54KOSHIISHI AKIRA13SAMSUNG ELECTRONICS CO LTD5HOLLAND JOHN PATRICK3LAM RES CORP3
Top patents by PatentIndex Score
83 records- 0198US7951262B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted May 31, 2011·486 cites·21 claims
- 0298US6072147APlasma processing systemTOKYO ELECTRON LTD·Filed 1997·Granted Jun 6, 2000·261 cites·5 claims
- 0397US8603293B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2011·Granted Dec 10, 2013·73 cites·22 claims
- 0497US7988816B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Aug 2, 2011·63 cites·22 claims
- 0597US6544380B2Plasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Apr 8, 2003·104 cites·3 claims
- 0697US6074518APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Jun 13, 2000·276 cites·3 claims
- 0797US5919332APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jul 6, 1999·445 cites·15 claims
- 0896US5900103APlasma treatment method and apparatusTOKYO ELECTRON LTD·Filed 1995·Granted May 4, 1999·173 cites·2 claims
- 0995US7988814B2Plasma processing apparatus, plasma processing method, focus ring, and focus ring componentTOKYO ELECTRON LTD·Filed 2007·Granted Aug 2, 2011·23 cites·17 claims
- 1095US7740737B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Jun 22, 2010·25 cites·14 claims
- 1194US9177756B2E-beam enhanced decoupled source for semiconductor processingHOLLAND JOHN PATRICK·Filed 2012·Granted Nov 3, 2015·23 cites·19 claims
- 1293US11195696B2Electron beam generator, plasma processing apparatus having the same and plasma processing method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Dec 7, 2021·4 cites·17 claims
- 1393US8137471B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2010·Granted Mar 20, 2012·12 cites·22 claims
- 1493US7537672B1Apparatus for plasma processingTOKYO ELECTRON LTD·Filed 2000·Granted May 26, 2009·44 cites·5 claims
- 1593US6733624B2Apparatus for holding an object to be processedTOKYO ELECTRON LTD·Filed 2003·Granted May 11, 2004·66 cites·13 claims
- 1691US10720314B2Confinement ring for use in a plasma processing systemLAM RES CORP·Filed 2017·Granted Jul 21, 2020·5 cites·22 claims
- 1791US5083061AElectron beam excited ion sourceTOKYO ELECTRON LTD·Filed 1990·Granted Jan 21, 1992·67 cites·15 claims
- 1890US11342166B2Confinement ring for use in a plasma processing systemLAM RES CORP·Filed 2020·Granted May 24, 2022·2 cites·18 claims
- 1990US6426477B1Plasma processing method and apparatus for eliminating damages in a plasma process of a substrateTOKYO ELECTRON LTD·Filed 2000·Granted Jul 30, 2002·32 cites·16 claims
- 2089US10861678B2Plasma etching apparatus and methodTOKYO ELECTRON LTD·Filed 2018·Granted Dec 8, 2020·4 cites·15 claims
- 2189US9490105B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2013·Granted Nov 8, 2016·6 cites·19 claims
- 2289US6576860B2Plasma processing method and apparatus for eliminating damages in a plasma process of a substrateTOKYO ELECTRON LTD·Filed 2002·Granted Jun 10, 2003·28 cites·6 claims
- 2388US11798788B2Hollow cathode, an apparatus including a hollow cathode for manufacturing a semiconductor device, and a method of manufacturing a semiconductor device using a hollow cathodeSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 24, 2023·2 cites·20 claims
- 2488US8852385B2Plasma etching apparatus and methodKOSHIISHI AKIRA·Filed 2007·Granted Oct 7, 2014·12 cites·17 claims
- 2588US8741098B2Table for use in plasma processing system and plasma processing systemKOSHIISHI AKIRA·Filed 2007·Granted Jun 3, 2014·11 cites·13 claims
- 2688US8084375B2Hot edge ring with sloped upper surfaceKOSHIISHI AKIRA·Filed 2010·Granted Dec 27, 2011·13 cites·15 claims
- 2788US8008596B2Plasma processing apparatus and electrode used thereinTOKYO ELECTRON LTD·Filed 2007·Granted Aug 30, 2011·10 cites·20 claims
- 2888US7506610B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2005·Granted Mar 24, 2009·15 cites·16 claims
- 2988US6764575B1Magnetron plasma processing apparatusTOKYO ELECTRON LTD·Filed 2000·Granted Jul 20, 2004·36 cites·13 claims
- 3088US6106737APlasma treatment method utilizing an amplitude-modulated high frequency powerTOKYO ELECTRON LTD·Filed 1998·Granted Aug 22, 2000·66 cites·4 claims
- 3187US10854431B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2019·Granted Dec 1, 2020·2 cites·12 claims
- 3287US10229815B2Plasma etching apparatus and methodTOKYO ELECTRON LTD·Filed 2014·Granted Mar 12, 2019·6 cites·14 claims
- 3387US9111728B2E-beam enhanced decoupled source for semiconductor processingHOLLAND JOHN PATRICK·Filed 2012·Granted Aug 18, 2015·8 cites·20 claims
- 3487US7993489B2Capacitive coupling plasma processing apparatus and method for using the sameTOKYO ELECTRON LTD·Filed 2006·Granted Aug 9, 2011·9 cites·13 claims
- 3586US11348760B2Plasma processing apparatus and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 31, 2022·2 cites·17 claims
- 3686US7494561B2Plasma processing apparatus and method, and electrode plate for plasma processing apparatusTOKYO ELECTRON LTD·Filed 2005·Granted Feb 24, 2009·12 cites·32 claims
- 3785US7658816B2Focus ring and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2004·Granted Feb 9, 2010·36 cites·8 claims
- 3885US6190495B1Magnetron plasma processing apparatusTOKYO ELECTRON LTD·Filed 1999·Granted Feb 20, 2001·81 cites·23 claims
- 3984US7882800B2Ring mechanism, and plasma processing device using the ring mechanismTOKYO ELECTRON LTD·Filed 2002·Granted Feb 8, 2011·31 cites·32 claims
- 4084US5028791AElectron beam excitation ion sourceTOKYO ELECTRON LTD·Filed 1990·Granted Jul 2, 1991·44 cites·5 claims
- 4183US10546727B2Plasma processing apparatus and methodTOKYO ELECTRON LTD·Filed 2016·Granted Jan 28, 2020·2 cites·9 claims
- 4281US7449414B2Method of treating a mask layer prior to performing an etching processTOKYO ELECTRON LTD·Filed 2006·Granted Nov 11, 2008·7 cites·21 claims
- 4381US5928963APlasma etching methodTOKYO ELECTRON LTD·Filed 1996·Granted Jul 27, 1999·62 cites·22 claims
- 4480US8790490B2Plasma processing apparatus and methodKOSHIISHI AKIRA·Filed 2012·Granted Jul 29, 2014·3 cites·14 claims
- 4580US6423242B1Etching methodTOKYO ELECTRON LTD·Filed 1999·Granted Jul 23, 2002·58 cites·5 claims
- 4679US8080126B2Plasma processing apparatusKOSHIISHI AKIRA·Filed 2008·Granted Dec 20, 2011·4 cites·4 claims
- 4779US5101110AIon generatorTOKYO ELECTRON LTD·Filed 1990·Granted Mar 31, 1992·33 cites·19 claims
- 4878US11791140B2Confinement ring for use in a plasma processing systemLAM RES CORP·Filed 2022·Granted Oct 17, 2023·0 cites·6 claims
- 4977US8512510B2Plasma processing method and apparatusKOSHIISHI AKIRA·Filed 2011·Granted Aug 20, 2013·3 cites·17 claims
- 5077US5252892APlasma processing apparatusTOKYO ELECTRON LTD·Filed 1991·Granted Oct 12, 1993·30 cites·12 claims
Showing the top 50 of 83 patent records by PatentIndex Score.
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