Inventor · disambiguated record
Masato Horiguchi
Also filed as: HORIGUCHI MASATO
22 granted patents·4 pending applications·104 citations·filing 2001–2023
94Inventor score
Files withTOKYO ELECTRON LTD6GKN AUTOMOTIVE LTD5SONY CORP4SAMSUNG ELECTRONICS CO LTD3FUTAGAMI MOTOMASA2
Top patents by PatentIndex Score
26 records- 0193US11402006B2Differential deviceGKN AUTOMOTIVE LTD·Filed 2021·Granted Aug 2, 2022·3 cites·7 claims
- 0292US11885399B2Power transmission deviceGKN AUTOMOTIVE LTD·Filed 2023·Granted Jan 30, 2024·2 cites·13 claims
- 0392US8858754B2Plasma processing apparatusHORIGUCHI MASATO·Filed 2011·Granted Oct 14, 2014·30 cites·2 claims
- 0491US11879533B2Differential deviceGKN AUTOMOTIVE LTD·Filed 2022·Granted Jan 23, 2024·2 cites·5 claims
- 0586US11348760B2Plasma processing apparatus and method of manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted May 31, 2022·2 cites·17 claims
- 0684US10910251B2Pin control method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Feb 2, 2021·3 cites·6 claims
- 0784US10438834B2Pin control methodTOKYO ELECTRON LTD·Filed 2018·Granted Oct 8, 2019·3 cites·6 claims
- 0879US7461161B2Information processing apparatus and method for decoding encoded dataSONY CORP·Filed 2002·Granted Dec 2, 2008·30 cites·22 claims
- 0975US9685305B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2014·Granted Jun 20, 2017·4 cites·6 claims
- 1074US11940015B2Power transmission deviceGKN AUTOMOTIVE LTD·Filed 2023·Granted Mar 26, 2024·0 cites·8 claims
- 1172US9520276B2Electrode assembly and plasma processing apparatusTAKAHASHI CHIKAKO·Filed 2012·Granted Dec 13, 2016·5 cites·18 claims
- 1271US9455125B2Substrate processing apparatusYOSHIMURA AKIHIRO·Filed 2011·Granted Sep 27, 2016·3 cites·10 claims
- 1366US12437969B2Plasma processing equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Oct 7, 2025·0 cites·14 claims
- 1464US8583927B2Streaming system and streaming methodFUTAGAMI MOTOMASA·Filed 2011·Granted Nov 12, 2013·1 cites·15 claims
- 1563US6883043B2Information processing apparatus incorporated in a control unit storing an authentication information and transmitting a command to request an access right when a first mode is setSONY CORP·Filed 2001·Granted Apr 19, 2005·9 cites·18 claims
- 1662US7618515B2Focus ring, plasma etching apparatus and plasma etching methodTOKYO ELECTRON LTD·Filed 2005·Granted Nov 17, 2009·1 cites·12 claims
- 1761US8192577B2Focus ring, plasma etching apparatus and plasma etching methodSATOH DAIKI·Filed 2009·Granted Jun 5, 2012·2 cites·8 claims
- 1860US9088548B2Streaming system and methodSONY CORP·Filed 2013·Granted Jul 21, 2015·0 cites·16 claims
- 1958US8572380B2Streaming system and streaming methodFUTAGAMI MOTOMASA·Filed 2003·Granted Oct 29, 2013·4 cites·30 claims
- 2053US10320759B2Streaming system and methodSONY CORP·Filed 2015·Granted Jun 11, 2019·0 cites·9 claims
- 2152US11501953B2Plasma processing equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Nov 15, 2022·0 cites·16 claims
- 2244US2004013399A1Information processing method and apparatusFiled 2002·Application pending·0 cites
- 2342US2022163103A1Final reduction apparatusGKN AUTOMOTIVE LTD·Filed 2021·Application pending·0 cites
- 2441US2006288934A1Electrode assembly and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2006·Application pending·0 cites
- 2541US2003069979A1Information processing apparatusFiled 2001·Application pending·0 cites
- 2638US10347499B2Method for etching layer to be etchedTOKYO ELECTRON LTD·Filed 2016·Granted Jul 9, 2019·0 cites·4 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →