Inventor · disambiguated record
Burn Jeng Lin
Also filed as: LIN BURN J · LIN BURN-JENG
157 granted patents·23 pending applications·4,128 citations·filing 1975–2025
99Inventor score
Files withTAIWAN SEMICONDUCTOR MFG84TAIWAN SEMICONDUCTOR MFG CO LTD34IBM22LIN BURN JENG12UNIV NAT TSING HUA4
Top patents by PatentIndex Score
180 records- 0199US8722286B2Devices and methods for improved reflective electron beam lithographyYU CHEN-HUA·Filed 2012·Granted May 13, 2014·82 cites·20 claims
- 0299US8216767B2Patterning process and chemical amplified photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2009·Granted Jul 10, 2012·110 cites·19 claims
- 0399US6788477B2Apparatus for method for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Sep 7, 2004·517 cites·19 claims
- 0498US8828632B2Multiple-grid exposure methodTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 9, 2014·26 cites·20 claims
- 0598US8762900B2Method for proximity correctionSHIN JAW-JUNG·Filed 2012·Granted Jun 24, 2014·121 cites·13 claims
- 0698US8658344B2Patterning process and photoresist with a photodegradable baseWANG CHIEN-WEI·Filed 2012·Granted Feb 25, 2014·93 cites·19 claims
- 0798US7252909B2Method to reduce CD non-uniformity in IC manufacturingTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Aug 7, 2007·199 cites·22 claims
- 0898US4456371AOptical projection printing threshold leveling arrangementIBM·Filed 1982·Granted Jun 26, 1984·178 cites·4 claims
- 0997US9810994B2Systems and methods for high-throughput and small-footprint scanning exposure for lithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Nov 7, 2017·8 cites·20 claims
- 1097US9046789B2Immersion lithography system using a sealed wafer bathLIN BURN JENG·Filed 2012·Granted Jun 2, 2015·12 cites·20 claims
- 1197US8846278B2Electron beam lithography system and method for improving throughputTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Sep 30, 2014·26 cites·14 claims
- 1297US8822106B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2012·Granted Sep 2, 2014·31 cites·22 claims
- 1397US8584057B2Non-directional dithering methodsLiu pei-yi·Filed 2012·Granted Nov 12, 2013·33 cites·20 claims
- 1497US8507177B2Photoresist materials and photolithography processesWANG HSIEN-CHENG·Filed 2011·Granted Aug 13, 2013·34 cites·19 claims
- 1597US8510687B1Error diffusion and grid shift in lithographyLiu pei-yi·Filed 2012·Granted Aug 13, 2013·32 cites·20 claims
- 1697US7224427B2Megasonic immersion lithography exposure apparatus and methodTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted May 29, 2007·95 cites·31 claims
- 1797US5571560AProximity-dispensing high-throughput low-consumption resist coating deviceFiled 1994·Granted Nov 5, 1996·111 cites·12 claims
- 1897US5472814AOrthogonally separated phase shifted and unphase shifted mask patterns for image improvementIBM·Filed 1994·Granted Dec 5, 1995·154 cites·20 claims
- 1996US8767178B2Immersion lithography system using direction-controlling fluid inletsLIN BURN JENG·Filed 2012·Granted Jul 1, 2014·21 cites·17 claims
- 2096US8530121B2Multiple-grid exposure methodWANG WEN CHUAN·Filed 2012·Granted Sep 10, 2013·37 cites·20 claims
- 2196US8524427B2Electron beam lithography system and method for improving throughputSHIN JAW-JUNG·Filed 2011·Granted Sep 3, 2013·30 cites·20 claims
- 2296US7266803B2Layout generation and optimization to improve photolithographic performanceTAIWAN SEMICONDUCTOR MFG·Filed 2005·Granted Sep 4, 2007·82 cites·30 claims
- 2396US7091502B2Apparatus and method for immersion lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2004·Granted Aug 15, 2006·72 cites·23 claims
- 2496US5565286ACombined attenuated-alternating phase shifting mask structure and fabrication methods thereforIBM·Filed 1994·Granted Oct 15, 1996·126 cites·7 claims
- 2596US5523186ASplit and cover technique for phase shifting photolithographyIBM·Filed 1994·Granted Jun 4, 1996·119 cites·24 claims
- 2696US5366757AIn situ resist control during spray and spin in vaporIBM·Filed 1992·Granted Nov 22, 1994·112 cites·30 claims
- 2796US4585342ASystem for real-time monitoring the characteristics, variations and alignment errors of lithography structuresIBM·Filed 1984·Granted Apr 29, 1986·95 cites·10 claims
- 2896US4142107AResist development control systemIBM·Filed 1977·Granted Feb 27, 1979·87 cites·16 claims
- 2995US11824133B2Detection using semiconductor detectorTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Nov 21, 2023·3 cites·20 claims
- 3095US9594862B2Method of fabricating an integrated circuit with non-printable dummy featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Mar 14, 2017·19 cites·16 claims
- 3195US4902899ALithographic process having improved image qualityIBM·Filed 1987·Granted Feb 20, 1990·153 cites·6 claims
- 3294US8987689B2Efficient scan for E-beam lithographyCHEN CHENG-HUNG·Filed 2012·Granted Mar 24, 2015·19 cites·20 claims
- 3394US8564759B2Apparatus and method for immersion lithographyCHANG CHING-YU·Filed 2007·Granted Oct 22, 2013·20 cites·20 claims
- 3494US8208116B2Immersion lithography system using a sealed wafer bathLIN BURN JENG·Filed 2007·Granted Jun 26, 2012·17 cites·28 claims
- 3594US5715064AStep and repeat apparatus having enhanced accuracy and increased throughputIBM·Filed 1994·Granted Feb 3, 1998·97 cites·4 claims
- 3693US8381139B2Method for metal correlated via split for double patterningTAIWAN SEMICONDUCTOR MFG·Filed 2011·Granted Feb 19, 2013·12 cites·20 claims
- 3793US6982135B2Pattern compensation for stitchingTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted Jan 3, 2006·54 cites·18 claims
- 3893US6492073B1Removal of line end shortening in microlithography and mask set for removalTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Dec 10, 2002·59 cites·20 claims
- 3993US5795685ASimple repair method for phase shifting masksIBM·Filed 1997·Granted Aug 18, 1998·102 cites·47 claims
- 4092US4737425APatterned resist and processIBM·Filed 1986·Granted Apr 12, 1988·129 cites·31 claims
- 4191US7829248B2Pellicle stress reliefTAIWAN SEMICONDUCTOR MFG·Filed 2008·Granted Nov 9, 2010·17 cites·20 claims
- 4291US4211834AMethod of using a o-quinone diazide sensitized phenol-formaldehyde resist as a deep ultraviolet light exposure maskIBM·Filed 1977·Granted Jul 8, 1980·55 cites·21 claims
- 4390US9436788B2Method of fabricating an integrated circuit with block dummy for optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 6, 2016·11 cites·19 claims
- 4490US9436787B2Method of fabricating an integrated circuit with optimized pattern density uniformityTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Sep 6, 2016·11 cites·20 claims
- 4590US7986395B2Immersion lithography apparatus and methodsTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Jul 26, 2011·15 cites·20 claims
- 4690US6664011B2Hole printing by packing and unpacking using alternating phase-shifting masksTAIWAN SEMICONDUCTOR MFG·Filed 2001·Granted Dec 16, 2003·55 cites·61 claims
- 4790US5288569AFeature biassing and absorptive phase-shifting techniques to improve optical projection imagingIBM·Filed 1992·Granted Feb 22, 1994·65 cites·22 claims
- 4889US11061317B2Method of fabricating an integrated circuit with non-printable dummy featuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jul 13, 2021·4 cites·20 claims
- 4989US6711732B1Full sized scattering bar alt-PSM technique for IC manufacturing in sub-resolution eraTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Mar 23, 2004·25 cites·10 claims
- 5088US9329488B2Grid refinement methodTAIWAN SEMICONDUCTOR MFG·Filed 2015·Granted May 3, 2016·2 cites·20 claims
Showing the top 50 of 180 patent records by PatentIndex Score.
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