Inventor · disambiguated record
Tomoaki Ishida
Also filed as: ISHIDA TOMOAKI
15 granted patents·2 pending applications·525 citations·filing 1988–2014
94Inventor score
Files withMITSUBISHI ELECTRIC CORP12DAIO SEISHI KK1MORI SEIKI HITECH CO LTD1SHIOMI TAKEYUKI1SUMITOMO ELECTRIC INDUSTRIES1
Top patents by PatentIndex Score
17 records- 0194US5246532APlasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Sep 21, 1993·97 cites·7 claims
- 0294US5213658APlasma processing methodMITSUBISHI ELECTRIC CORP·Filed 1991·Granted May 25, 1993·103 cites·3 claims
- 0391US5306671AMethod of treating semiconductor substrate surface and method of manufacturing semiconductor device including such treating methodMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Apr 26, 1994·89 cites·12 claims
- 0490US7013544B2Machine tool and pallet changer for machine toolMORI SEIKI HITECH CO LTD·Filed 2003·Granted Mar 21, 2006·49 cites·11 claims
- 0581US7887527B2Absorbent article and inner absorbent articleDAIO SEISHI KK·Filed 2005·Granted Feb 15, 2011·27 cites·4 claims
- 0679US4915979ASemiconductor wafer treating device utilizing ECR plasmaMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Apr 10, 1990·24 cites·6 claims
- 0778US4891095AMethod and apparatus for plasma treatmentMITSUBISHI ELECTRIC CORP·Filed 1989·Granted Jan 2, 1990·23 cites·16 claims
- 0874US4982138ASemiconductor wafer treating device utilizing a plasmaMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jan 1, 1991·19 cites·5 claims
- 0962US5240559ADry etching method of copper or copper alloy interconnection layer employing plasma of an iodine compoundMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Aug 31, 1993·33 cites·10 claims
- 1055US5474615AMethod for cleaning semiconductor devicesMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Dec 12, 1995·25 cites·10 claims
- 1150US5318654AApparatus for cleaning a substrate with metastable heliumMITSUBISHI ELECTRIC CORP·Filed 1992·Granted Jun 7, 1994·17 cites·5 claims
- 1249US9653297B2Method of manufacturing silicon carbide semiconductor device by forming metal-free protection filmSUMITOMO ELECTRIC INDUSTRIES·Filed 2014·Granted May 16, 2017·0 cites·7 claims
- 1348US5038013APlasma processing apparatus including an electromagnet with a bird cage coreMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Aug 6, 1991·8 cites·7 claims
- 1443US2006282055A1Absorbing pad for maleSHIOMI TAKEYUKI·Filed 2004·Application pending·0 cites
- 1538US2006071258A1Semiconductor deviceTOMIOKA KAZUHIRO·Filed 2004·Application pending·0 cites
- 1637US5147465AMethod of cleaning a surfaceMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Sep 15, 1992·7 cites·2 claims
- 1733US5846870AMethod of measuring a semiconductor device and a method of making a semiconductor deviceMITSUBISHI ELECTRIC CORP·Filed 1997·Granted Dec 8, 1998·4 cites·7 claims
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