Inventor · disambiguated record
Masahiro Yoshidome
Also filed as: YOSHIDOME MASAHIRO
12 granted patents·13 pending applications·4 citations·filing 2008–2024
81Inventor score
Top patents by PatentIndex Score
25 records- 0179US12311294B2Chemical liquid purification method and chemical liquidFUJIFILM CORP·Filed 2024·Granted May 27, 2025·0 cites·7 claims
- 0277US8802349B2Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the compositionYOSHIDOME MASAHIRO·Filed 2010·Granted Aug 12, 2014·4 cites·14 claims
- 0375US11958005B2Chemical liquid purification method and chemical liquidFUJIFILM CORP·Filed 2022·Granted Apr 16, 2024·0 cites·6 claims
- 0473US12434997B2Chemical liquid storage bodyFUJIFILM CORP·Filed 2024·Granted Oct 7, 2025·0 cites·20 claims
- 0565US11491428B2Chemical liquid purification method and chemical liquidFUJIFILM CORP·Filed 2020·Granted Nov 8, 2022·0 cites·21 claims
- 0662US2025028249A1Chemical solutionFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0761US12494400B2Method for inspecting chemical solution, method for producing chemical solution, method for controlling chemical solution, method for producing semiconductor device, method for inspecting resist composition, method for producing resist composition, method for controlling resist composition, and method for checking contamination status of semiconductor manufacturing apparatusFUJIFILM CORP·Filed 2022·Granted Dec 9, 2025·0 cites·32 claims
- 0857US12210287B2Resist pattern forming method and semiconductor chip manufacturing methodFUJIFILM CORP·Filed 2021·Granted Jan 28, 2025·0 cites·19 claims
- 0957US11976001B2Chemical liquid storage bodyFUJIFILM CORP·Filed 2020·Granted May 7, 2024·0 cites·19 claims
- 1057US2023395366A1Defect removal device, defect removal method, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1156US11351503B2Chemical liquid purification methodFUJIFILM CORP·Filed 2020·Granted Jun 7, 2022·0 cites·38 claims
- 1256US2023369086A1Analysis apparatus and analysis methodFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1355US2023243780A1Method of manufacturing semiconductor device, method of washing semiconductor manufacturing apparatus, and method of measuring cleanliness of washing solutionFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1454US2023229078A1Chemical liquid supply method and pattern forming methodFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1547US8431330B2Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agentHOSHINO WATARU·Filed 2011·Granted Apr 30, 2013·0 cites·9 claims
- 1647US2010203445A1Negative resist composition and resist pattern forming method using the sameFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 1746US2014212814A1Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern using the composition, process for manufacturing electronic device and electronic deviceFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 1845US9454079B2Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2014·Granted Sep 27, 2016·0 cites·11 claims
- 1944US8088566B2Surface-treating agent for pattern formation and pattern-forming method using the surface-treating agentHOSHINO WATARU·Filed 2008·Granted Jan 3, 2012·0 cites·40 claims
- 2044US2010183978A1Surface-treating agent for pattern formation and pattern forming method using the treating agentFUJIFILM CORP·Filed 2008·Application pending·0 cites
- 2144US2014234759A1Actinic ray- or radiation-sensitive resin composition, actinic ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2014·Application pending·0 cites
- 2238US2011223536A1Actinic ray-sensitive or radiation-sensitive resin composition, and resist film and pattern forming method using the sameFUJIFILM CORP·Filed 2011·Application pending·0 cites
- 2336US2017059995A1Pattern forming method, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 2435US2012171618A1Actinic-ray- or radiation-sensitive resin composition and method of forming a pattern using the sameIIZUKA YUSUKE·Filed 2012·Application pending·0 cites
- 2534US2016054658A1Pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2015·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →