Inventor · disambiguated record
Diego Feijoo
Also filed as: FEIJOO DIEGO
10 granted patents·2 pending applications·22 citations·filing 2007–2012
83Inventor score
Technology areasH10P
Top patents by PatentIndex Score
12 records- 0180US7938911B2Process for cleaning a semiconductor wafer using a cleaning solutionSILTRONIC AG·Filed 2008·Granted May 10, 2011·8 cites·11 claims
- 0278US8070882B2Method for the wet-chemical treatment of a semiconductor waferSCHWAB GUENTER·Filed 2008·Granted Dec 6, 2011·8 cites·19 claims
- 0367US7829467B2Method for producing a polished semiconductorSILTRONIC AG·Filed 2007·Granted Nov 9, 2010·3 cites·16 claims
- 0465US7538008B2Method for producing a layer structureSILTRONIC AG·Filed 2007·Granted May 26, 2009·2 cites·11 claims
- 0560US7799692B2Method and apparatus for the treatment of a semiconductor waferSILTRONIC AG·Filed 2007·Granted Sep 21, 2010·1 cites·13 claims
- 0654US8372213B2Method for the treatment of a semiconductor waferSILTRONIC AG·Filed 2009·Granted Feb 12, 2013·0 cites·14 claims
- 0749US8580046B2Method for the treatment of a semiconductor waferSILTRONIC AG·Filed 2012·Granted Nov 12, 2013·0 cites·19 claims
- 0845US2009071507A1Process for cleaning a semiconductor waferSILTRONIC AG·Filed 2008·Application pending·0 cites
- 0944US7988876B2Method for reducing and homogenizing the thickness of a semiconductor layer which lies on the surface of an electrically insulating materialSILTRONIC AG·Filed 2008·Granted Aug 2, 2011·0 cites·13 claims
- 1042US9230794B2Process for cleaning, drying and hydrophilizing a semiconductor waferSCHWAB GUENTER·Filed 2008·Granted Jan 5, 2016·0 cites·10 claims
- 1136US8685270B2Method for producing a semiconductor waferSCHWANDNER JUERGEN·Filed 2010·Granted Apr 1, 2014·0 cites·10 claims
- 1226US2012248068A1Process Module for the Inline-Treatment of SubstratesSCHIENLE FRANK·Filed 2010·Application pending·0 cites
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