Inventor · disambiguated record
Maya Angelova Doytcheva
Also filed as: DOYTCHEVA MAYA · DOYTCHEVA MAYA ANGELOVA
6 granted patents·3 pending applications·15 citations·filing 2002–2014
74Inventor score
Files withSEWELL HARRY2VAN HAREN RICHARD JOHANNES FRANCISCUS2ASML HOLDING NV1ASML NETHERLANDS BV1DOYTCHEVA MAYA ANGELOVA1
Top patents by PatentIndex Score
9 records- 0178US8625096B2Method and system for increasing alignment target contrastSEWELL HARRY·Filed 2010·Granted Jan 7, 2014·3 cites·23 claims
- 0269US6600260B2Gas discharge lamp with down conversion luminophoreKONINKL PHILIPS ELECTRONICS NV·Filed 2002·Granted Jul 29, 2003·11 cites·11 claims
- 0363US8709908B2Improving alignment target contrast in a lithographic double patterning processSEWELL HARRY·Filed 2010·Granted Apr 29, 2014·1 cites·18 claims
- 0456US8980724B2Alignment target contrast in a lithographic double patterning processASML HOLDING NV·Filed 2014·Granted Mar 17, 2015·0 cites·20 claims
- 0555US8319967B2Marker structure and method of forming the sameVAN HAREN RICHARD JOHANNES FRANCISCUS·Filed 2008·Granted Nov 27, 2012·0 cites·12 claims
- 0651US2013070226A1Marker structure and method of forming the sameVAN HAREN RICHARD JOHANNES FRANCISCUS·Filed 2012·Application pending·0 cites
- 0747US2013017378A1Apparatus and Method for Providing Resist Alignment Marks in a Double Patterning Lithographic ProcessASML NETHERLANDS BV·Filed 2012·Application pending·0 cites
- 0841US8329366B2Apparatus and method for providing resist alignment marks in a double patterning lithographic processDOYTCHEVA MAYA ANGELOVA·Filed 2010·Granted Dec 11, 2012·0 cites·13 claims
- 0938US2006290258A1Gas discharge lamp with down conversion phosphorKONINKLIKE PHILIPS ELECTRONICS·Filed 2004·Application pending·0 cites
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