Inventor · disambiguated record
Satoru Yamaki
Also filed as: YAMAKI SATORU
38 granted patents·3 pending applications·1,567 citations·filing 2008–2025
97Inventor score
Top patents by PatentIndex Score
41 records- 0199USD793976SSubstrate retaining ringEBARA CORP·Filed 2016·Granted Aug 8, 2017·434 cites·1 claims
- 0299USD634719SElastic membrane for semiconductor wafer polishing apparatusEBARA CORP·Filed 2010·Granted Mar 22, 2011·539 cites·1 claims
- 0399USD633452SElastic membrane for semiconductor wafer polishing apparatusEBARA CORP·Filed 2010·Granted Mar 1, 2011·342 cites·1 claims
- 0495US9403255B2Polishing apparatus and polishing methodEBARA CORP·Filed 2013·Granted Aug 2, 2016·14 cites·49 claims
- 0595US8932106B2Polishing apparatus having thermal energy measuring meansFUKUSHIMA MAKOTO·Filed 2011·Granted Jan 13, 2015·14 cites·9 claims
- 0694US8859070B2Elastic membraneEBARA CORP·Filed 2012·Granted Oct 14, 2014·16 cites·25 claims
- 0793USD769200SElastic membrane for semiconductor wafer polishing apparatusEBARA CORP·Filed 2013·Granted Oct 18, 2016·48 cites·1 claims
- 0890US10391603B2Polishing apparatus, control method and recording mediumEBARA CORP·Filed 2016·Granted Aug 27, 2019·4 cites·19 claims
- 0989US11179823B2Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membraneEBARA CORP·Filed 2017·Granted Nov 23, 2021·3 cites·19 claims
- 1089US10702972B2Polishing apparatusEBARA CORP·Filed 2014·Granted Jul 7, 2020·7 cites·15 claims
- 1189USD839224SElastic membrane for semiconductor wafer polishingEBARA CORP·Filed 2017·Granted Jan 29, 2019·28 cites·1 claims
- 1289US9662764B2Substrate holder, polishing apparatus, and polishing methodEBARA CORP·Filed 2013·Granted May 30, 2017·7 cites·18 claims
- 1387US11958163B2Substrate holding apparatus, elastic membrane, polishing apparatus, and method for replacing elastic membraneEBARA CORP·Filed 2021·Granted Apr 16, 2024·1 cites·16 claims
- 1485US10464185B2Substrate polishing method, top ring, and substrate polishing apparatusEBARA CORP·Filed 2017·Granted Nov 5, 2019·2 cites·8 claims
- 1584USD766849SSubstrate retaining ringEBARA CORP·Filed 2013·Granted Sep 20, 2016·25 cites·1 claims
- 1683USD918161SElastic membraneEBARA CORP·Filed 2018·Granted May 4, 2021·1 cites·1 claims
- 1780US11088011B2Elastic membrane, substrate holding device, and polishing apparatusEBARA CORP·Filed 2018·Granted Aug 10, 2021·2 cites·13 claims
- 1879USD808349SElastic membrane for semiconductor wafer polishing apparatusEBARA CORP·Filed 2016·Granted Jan 23, 2018·18 cites·1 claims
- 1979US9073170B2Polishing apparatus having thermal energy measuring meansEBARA CORP·Filed 2014·Granted Jul 7, 2015·2 cites·11 claims
- 2076USD799437SSubstrate retaining ringEBARA CORP·Filed 2016·Granted Oct 10, 2017·16 cites·1 claims
- 2175US9815171B2Substrate holder, polishing apparatus, polishing method, and retaining ringEBARA CORP·Filed 2014·Granted Nov 14, 2017·2 cites·27 claims
- 2273USD989012SElastic membraneEBARA CORP·Filed 2021·Granted Jun 13, 2023·4 cites·1 claims
- 2372US2025140594A1Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatusEBARA CORP·Filed 2025·Application pending·0 cites
- 2471US2024198480A1Method of creating responsive profile of polishing rate of workpiece, polishing method, and polishing apparatusEBARA CORP·Filed 2023·Application pending·0 cites
- 2570US12230529B2Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatusEBARA CORP·Filed 2021·Granted Feb 18, 2025·0 cites·4 claims
- 2669USD794585SRetainer ring for substrateEBARA CORP·Filed 2016·Granted Aug 15, 2017·12 cites·1 claims
- 2766USD859332SElastic membrane for semiconductor wafer polishingEBARA CORP·Filed 2017·Granted Sep 10, 2019·10 cites·1 claims
- 2866US8870625B2Method and apparatus for dressing polishing pad, profile measuring method, substrate polishing apparatus, and substrate polishing methodTOGAWA TETSUJI·Filed 2008·Granted Oct 28, 2014·3 cites·13 claims
- 2965US12068189B2Elastic membrane, substrate holding device, and polishing apparatusEBARA CORP·Filed 2021·Granted Aug 20, 2024·0 cites·4 claims
- 3065US10991613B2Substrate holding apparatus, substrate suction determination method, substrate polishing apparatus, substrate polishing method, method of removing liquid from upper surface of wafer to be polished, elastic film for pressing wafer against polishing pad, substrate release method, and constant amount gas supply apparatusEBARA CORP·Filed 2019·Granted Apr 27, 2021·0 cites·20 claims
- 3165US10213896B2Elastic membrane, substrate holding apparatus, and polishing apparatusEBARA CORP·Filed 2017·Granted Feb 26, 2019·0 cites·21 claims
- 3263US9149903B2Polishing apparatus having substrate holding apparatusEBARA CORP·Filed 2014·Granted Oct 6, 2015·0 cites·13 claims
- 3361US12128523B2Polishing apparatusEBARA CORP·Filed 2020·Granted Oct 29, 2024·0 cites·14 claims
- 3459US11745306B2Polishing apparatus and method of controlling inclination of stationary ringEBARA CORP·Filed 2019·Granted Sep 5, 2023·0 cites·7 claims
- 3556USD913977SElastic membrane for semiconductor wafer polishingEBARA CORP·Filed 2018·Granted Mar 23, 2021·5 cites·1 claims
- 3655US9999956B2Polishing device and polishing methodEBARA CORP·Filed 2015·Granted Jun 19, 2018·0 cites·21 claims
- 3749USD770990SElastic membrane for semiconductor wafer polishing apparatusEBARA CORP·Filed 2014·Granted Nov 8, 2016·6 cites·1 claims
- 3849US2024253181A1Method of creating responsiveness profile of polishing rate of workpiece, polishing method, and computer-readable storage medium storing programEBARA CORP·Filed 2022·Application pending·0 cites
- 3946US11731235B2Polishing apparatus and polishing methodEBARA CORP·Filed 2019·Granted Aug 22, 2023·0 cites·2 claims
- 4045USD1021832SElastic membraneEBARA CORP·Filed 2023·Granted Apr 9, 2024·0 cites·1 claims
- 4141USD813180SElastic membrane for semiconductor wafer polishing apparatusEBARA CORP·Filed 2016·Granted Mar 20, 2018·2 cites·1 claims
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