Inventor · disambiguated record
Yusuke Muraki
Also filed as: MURAKI YUSUKE
14 granted patents·7 pending applications·399 citations·filing 2000–2021
90Inventor score
Top patents by PatentIndex Score
21 records- 0194US8741065B2Substrate processing apparatusODAGIRI MASAYA·Filed 2011·Granted Jun 3, 2014·343 cites·9 claims
- 0284US8353986B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2006·Granted Jan 15, 2013·15 cites·22 claims
- 0380US10923356B2Gas phase etch with controllable etch selectivity of silicon-germanium alloysTOKYO ELECTRON LTD·Filed 2019·Granted Feb 16, 2021·2 cites·19 claims
- 0473US6551896B2Capacitor for analog circuit, and manufacturing method thereofTOKYO ELECTRON LTD·Filed 2000·Granted Apr 22, 2003·16 cites·17 claims
- 0568US6355582B1Silicon nitride film formation methodTOKYO ELECTRON LTD·Filed 2000·Granted Mar 12, 2002·14 cites·5 claims
- 0663US6797560B2Method of manufacturing a capacitor having tantalum oxide film as an insulating filmTOKYO ELECTRON LTD·Filed 2001·Granted Sep 28, 2004·9 cites·16 claims
- 0760US11328932B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2021·Granted May 10, 2022·0 cites·10 claims
- 0854US9911596B2Modification processing method and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2016·Granted Mar 6, 2018·0 cites·9 claims
- 0952US9443724B2Modification processing method and method of manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2015·Granted Sep 13, 2016·0 cites·17 claims
- 1051US11715643B2Gas phase etch with controllable etch selectivity of metalsTOKYO ELECTRON LTD·Filed 2020·Granted Aug 1, 2023·0 cites·16 claims
- 1151US9362149B2Etching method, etching apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2014·Granted Jun 7, 2016·0 cites·9 claims
- 1248US2009242129A1Thermal processing apparatus and processing systemTOKYO ELECTRON LTD·Filed 2009·Application pending·0 cites
- 1347US2010163179A1Substrate Processing ApparatusTOZAWA SHIGEKI·Filed 2006·Application pending·0 cites
- 1445US2012178263A1Substrate processing apparatusTOZAWA SHIGEKI·Filed 2012·Application pending·0 cites
- 1545US2011035957A1Gas processing apparatus, gas processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2007·Application pending·0 cites
- 1644US7897498B2Method for manufacturing semiconductor deviceTOKYO ELECTRON LTD·Filed 2005·Granted Mar 1, 2011·0 cites·9 claims
- 1743US2008134663A1Heat Transfer ThrusterTOTANI TSUYOSHI·Filed 2006·Application pending·0 cites
- 1843US2010216296A1Processing Method and Recording MediumMURAKI YUSUKE·Filed 2006·Application pending·0 cites
- 1942US9105586B2Etching of silicon oxide filmTOZAWA SHIGEKI·Filed 2008·Granted Aug 11, 2015·0 cites·6 claims
- 2040US2007184379A1Peeling-off method and reworking method of resist filmTOKYO ELECTRON LTD·Filed 2005·Application pending·0 cites
- 2135US9153465B2Substrate stage, substrate processing apparatus and substrate processing systemODAGIRI MASAYA·Filed 2011·Granted Oct 6, 2015·0 cites·6 claims
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