Inventor · disambiguated record
Jeffrey James Hendron
Also filed as: HENDRON JEFFREY J · HENDRON JEFFREY JAMES
22 granted patents·7 pending applications·133 citations·filing 2000–2020
93Inventor score
Files withROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC15ROHM & HAAS ELECT MAT10DOW GLOBAL TECHNOLOGIES LLC1HENDRON JEFFREY J1RODEL INC1
Top patents by PatentIndex Score
29 records- 0195US9259820B2Chemical mechanical polishing pad with polishing layer and windowROHM & HAAS ELECT MAT·Filed 2014·Granted Feb 16, 2016·36 cites·10 claims
- 0292US7807252B2Chemical mechanical polishing pad having secondary polishing medium capacity control groovesROHM & HAAS ELECT MAT·Filed 2006·Granted Oct 5, 2010·20 cites·3 claims
- 0391US9064806B1Soft and conditionable chemical mechanical polishing pad with windowROHM & HAAS ELECT MAT·Filed 2014·Granted Jun 23, 2015·13 cites·11 claims
- 0486US9102034B2Method of chemical mechanical polishing a substrateROHM & HAAS ELECT MAT·Filed 2013·Granted Aug 11, 2015·8 cites·11 claims
- 0586US7131895B2CMP pad having a radially alternating groove segment configurationROHM & HAAS ELECT MAT·Filed 2005·Granted Nov 7, 2006·12 cites·10 claims
- 0682US9802293B1Method to shape the surface of chemical mechanical polishing padsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 31, 2017·2 cites·13 claims
- 0774US6626740B2Self-leveling pads and methods relating theretoRODEL INC·Filed 2000·Granted Sep 30, 2003·22 cites·10 claims
- 0872US9630293B2Chemical mechanical polishing pad composite polishing layer formulationROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Apr 25, 2017·2 cites·11 claims
- 0970US9238296B2Multilayer chemical mechanical polishing pad stack with soft and conditionable polishing layerROHM & HAAS ELECT MAT·Filed 2013·Granted Jan 19, 2016·2 cites·15 claims
- 1069US9238295B2Soft and conditionable chemical mechanical window polishing padROHM & HAAS ELECT MAT·Filed 2013·Granted Jan 19, 2016·2 cites·18 claims
- 1169US6843709B1Chemical mechanical polishing method for reducing slurry refluxROHM & HAAS ELECT MAT·Filed 2003·Granted Jan 18, 2005·13 cites·10 claims
- 1264US9233451B2Soft and conditionable chemical mechanical polishing pad stackROHM & HAAS ELECT MAT·Filed 2013·Granted Jan 12, 2016·1 cites·18 claims
- 1357US2020381258A1Biased pulse cmp groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2020·Application pending·0 cites
- 1451US10777418B2Biased pulse CMP groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Sep 15, 2020·0 cites·10 claims
- 1549US10569383B2Flanged optical endpoint detection windows and CMP polishing pads containing themROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Feb 25, 2020·0 cites·8 claims
- 1646US2015065013A1Chemical mechanical polishing padDOW GLOBAL TECHNOLOGIES LLC·Filed 2013·Application pending·0 cites
- 1746US2010015895A1Chemical mechanical polishing pad having electrospun polishing layerHENDRON JEFFREY J·Filed 2008·Application pending·0 cites
- 1842US10092998B2Method of making composite polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Oct 9, 2018·0 cites·10 claims
- 1942US2018085891A1Apparatus for shaping the surface of chemical mechanical polishing padsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Application pending·0 cites
- 2042US2018169827A1Methods for making chemical mechanical planarization (cmp) polishing pads having integral windowsROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Application pending·0 cites
- 2142US2018085888A1Chemical mechanical polishing pads having a consistent pad surface microtextureROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Application pending·0 cites
- 2241US9034063B2Method of manufacturing grooved chemical mechanical polishing layersROHM & HAAS ELECT MAT·Filed 2012·Granted May 19, 2015·0 cites·1 claims
- 2340US10011002B2Method of making composite polishing layer for chemical mechanical polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2015·Granted Jul 3, 2018·0 cites·10 claims
- 2437US10857647B2High-rate CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·8 claims
- 2537US10586708B2Uniform CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Mar 10, 2020·0 cites·10 claims
- 2636US10857648B2Trapezoidal CMP groove patternROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·12 claims
- 2736US10861702B2Controlled residence CMP polishing methodROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 8, 2020·0 cites·8 claims
- 2831US10875146B2Debris-removal groove for CMP polishing padROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2016·Granted Dec 29, 2020·0 cites·10 claims
- 2927US2002081943A1Semiconductor substrate and lithographic mask processingFiled 2001·Application pending·0 cites
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