Inventor · disambiguated record
Sun-Yong Choi
Also filed as: CHOI SUN · CHOI SUN-YONG
21 granted patents·4 pending applications·110 citations·filing 1995–2013
93Inventor score
Top patents by PatentIndex Score
25 records- 0173US5676824AWater purifier with means for indicating when filter replacement is due and for automatically initiating a membrane washing stepSAMSUNG ELECTRONICS CO LTD·Filed 1995·Granted Oct 14, 1997·48 cites·9 claims
- 0267US7459810B2Stator of linear motorLG ELECTRONICS INC·Filed 2005·Granted Dec 2, 2008·2 cites·8 claims
- 0363US6800863B2Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Oct 5, 2004·6 cites·40 claims
- 0457US7446703B2Apparatus and method for receiving GPS signals in a mobile terminalSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Nov 4, 2008·5 cites·18 claims
- 0555US7289661B2Apparatus and method for inspecting a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Oct 30, 2007·5 cites·22 claims
- 0654US7046760B2Method of measuring and controlling concentration of dopants of a thin filmSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted May 16, 2006·4 cites·34 claims
- 0752US7280233B2Method and apparatus for inspecting an edge exposure area of a waferSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Oct 9, 2007·4 cites·21 claims
- 0852US6927077B2Method and apparatus for measuring contamination of a semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Aug 9, 2005·4 cites·21 claims
- 0951US6815236B2Method of measuring a concentration of a material and method of measuring a concentration of a dopant of a semiconductor deviceSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Nov 9, 2004·3 cites·14 claims
- 1050US2007222999A1Apparatus for monitoring a density profile of impuritiesSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 1149US7405817B2Method and apparatus for classifying defects of an objectSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jul 29, 2008·2 cites·43 claims
- 1249US7271890B2Method and apparatus for inspecting defectsSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Sep 18, 2007·2 cites·19 claims
- 1349US7113274B2Method and apparatus for inspecting a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Sep 26, 2006·2 cites·20 claims
- 1448US7573568B2Method and apparatus for detecting a photolithography processing error, and method and apparatus for monitoring a photolithography processSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Aug 11, 2009·1 cites·16 claims
- 1548US7310140B2Method and apparatus for inspecting a wafer surfaceSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Dec 18, 2007·2 cites·21 claims
- 1648US7274471B2Systems and methods for measuring distance of semiconductor patternsSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Sep 25, 2007·2 cites·23 claims
- 1747US6869215B2Method and apparatus for detecting contaminants in ion-implanted waferSAMSUNG ELECTRIC·Filed 2003·Granted Mar 22, 2005·2 cites·15 claims
- 1845US9714171B2Graphene-nano particle composite having nano particles crystallized therein at a high densityCHEORWON PLASMA RES INST·Filed 2013·Granted Jul 25, 2017·0 cites·9 claims
- 1945US5755469AWafer transfer bladeSAMSUNG ELECTRONICS CO LTD·Filed 1995·Granted May 26, 1998·15 cites·10 claims
- 2041US7186577B2Method for monitoring a density profile of impuritiesSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Mar 6, 2007·0 cites·20 claims
- 2141US2005285781A1GPS receiver and method for detecting a jammer signal using fast fourier transformSAMSUNG ELECTRONICS CO LTD·Filed 2005·Application pending·0 cites
- 2239US7355729B2Apparatus and method for measuring a thickness of a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Apr 8, 2008·1 cites·19 claims
- 2338US2004086167A1Method and apparatus for analyzing a sample employing fast fourier transformationFiled 2003·Application pending·0 cites
- 2437US2006170589A1Apparatus and method for maintaining time synchronization in AGPS receiverSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 2536US9711256B2Graphene-nano particle composite having nanoparticles crystallized therein at a high densityCHEORWON PLASMA RES INST·Filed 2013·Granted Jul 18, 2017·0 cites·15 claims
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