Inventor · disambiguated record
Toshiya Kotani
Also filed as: KOTANI TOSHIYA
97 granted patents·34 pending applications·900 citations·filing 1998–2016
99Inventor score
Top patents by PatentIndex Score
131 records- 0199US7120882B2Method of setting process parameter and method of setting process parameter and/or design ruleTOSHIBA KK·Filed 2005·Granted Oct 10, 2006·225 cites·11 claims
- 0295US7941767B2Photomask management method and photomask wash limit generating methodTOSHIBA KK·Filed 2008·Granted May 10, 2011·32 cites·15 claims
- 0395US7669172B2Pattern creation method, mask manufacturing method and semiconductor device manufacturing methodTOSHIBA KK·Filed 2008·Granted Feb 23, 2010·25 cites·20 claims
- 0494US7526748B2Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording mediumTOSHIBA KK·Filed 2005·Granted Apr 28, 2009·19 cites·19 claims
- 0594US7482661B2Pattern forming method and semiconductor device manufactured by using said pattern forming methodTOSHIBA KK·Filed 2005·Granted Jan 27, 2009·16 cites·20 claims
- 0693US7530049B2Mask manufacturing system, mask data creating method and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2006·Granted May 5, 2009·21 cites·20 claims
- 0791US7194704B2Design layout preparing methodTOSHIBA KK·Filed 2004·Granted Mar 20, 2007·61 cites·16 claims
- 0890US8122385B2Mask pattern correcting methodFUKUHARA KAZUYA·Filed 2008·Granted Feb 21, 2012·13 cites·24 claims
- 0988US7506301B2Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2005·Granted Mar 17, 2009·8 cites·12 claims
- 1087US7571417B2Method and system for correcting a mask pattern designTOSHIBA KK·Filed 2004·Granted Aug 4, 2009·23 cites·14 claims
- 1187US7337426B2Pattern correcting method, mask making method, method of manufacturing semiconductor device, pattern correction system, and computer-readable recording medium having pattern correction program recorded thereinTOSHIBA KK·Filed 2005·Granted Feb 26, 2008·9 cites·20 claims
- 1286US8307310B2Pattern generating method, method of manufacturing semiconductor device, computer program product, and pattern-shape-determination-parameter generating methodKOTANI TOSHIYA·Filed 2010·Granted Nov 6, 2012·11 cites·21 claims
- 1386US7700997B2Semiconductor memory deviceTOSHIBA KK·Filed 2006·Granted Apr 20, 2010·15 cites·9 claims
- 1486US7181707B2Method of setting process parameter and method of setting process parameter and/or design ruleTOSHIBA KK·Filed 2003·Granted Feb 20, 2007·28 cites·12 claims
- 1585USRE43659EMethod for making a design layout of a semiconductor integrated circuitKOTANI TOSHIYA·Filed 2010·Granted Sep 11, 2012·6 cites·13 claims
- 1685US8078996B2Method and system for correcting a mask pattern designIZUHA KYOKO·Filed 2009·Granted Dec 13, 2011·6 cites·7 claims
- 1784US8046722B2Method for correcting a mask pattern, system for correcting a mask pattern, program, method for manufacturing a photomask and method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2009·Granted Oct 25, 2011·5 cites·14 claims
- 1884US7925090B2Method of determining photo mask, method of manufacturing semiconductor device, and computer program productTOSHIBA KK·Filed 2006·Granted Apr 12, 2011·7 cites·14 claims
- 1984US7788626B2Pattern data correction method, pattern checking method, pattern check program, photo mask producing method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted Aug 31, 2010·7 cites·7 claims
- 2084US7770145B2Semiconductor device pattern creation method, pattern data processing program, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2006·Granted Aug 3, 2010·6 cites·11 claims
- 2184US7483155B2Structure inspection method, pattern formation method, process condition determination method and resist pattern evaluation apparatusTOSHIBA KK·Filed 2005·Granted Jan 27, 2009·6 cites·10 claims
- 2283US6853743B2Mask pattern correction method, mask pattern creation system using the correction method, and computer-readable recording mediumTOSHIBA KK·Filed 2000·Granted Feb 8, 2005·23 cites·1 claims
- 2382US7934175B2Parameter adjustment method, semiconductor device manufacturing method, and recording mediumTOSHIBA KK·Filed 2008·Granted Apr 26, 2011·8 cites·20 claims
- 2482US7370314B2Method and program for generating layout data of a semiconductor integrated circuit and method for manufacturing a semiconductor integrated circuit with optical proximity correctionTOSHIBA KK·Filed 2006·Granted May 6, 2008·6 cites·20 claims
- 2580US7266801B2Design pattern correction method and mask pattern producing methodTOSHIBA KK·Filed 2004·Granted Sep 4, 2007·31 cites·20 claims
- 2680US6507931B2Semiconductor integrated circuit designing method and systemTOSHIBA KK·Filed 2001·Granted Jan 14, 2003·20 cites·7 claims
- 2779US8527914B2Flare map calculating method and recording mediumUNO TAIGA·Filed 2012·Granted Sep 3, 2013·3 cites·20 claims
- 2879US7716628B2System, method and program for generating mask data, exposure mask and semiconductor device in consideration of optical proximity effectsTOSHIBA KK·Filed 2005·Granted May 11, 2010·5 cites·15 claims
- 2978US9953126B2Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2014·Granted Apr 24, 2018·4 cites·27 claims
- 3078US8336005B2Pattern dimension calculation method and computer program productTAGUCHI TAKAFUMI·Filed 2011·Granted Dec 18, 2012·5 cites·20 claims
- 3178US6907596B2Mask data generating apparatus, a computer implemented method for generating mask data and a computer program for controlling the mask data generating apparatusTOSHIBA KK·Filed 2003·Granted Jun 14, 2005·16 cites·15 claims
- 3278US6901577B2Pattern forming method and semiconductor device manufactured by using said pattern forming methodTOSHIBA KK·Filed 2002·Granted May 31, 2005·13 cites·44 claims
- 3377USRE42302EMethod for making a design layout and maskTOSHIBA KK·Filed 2007·Granted Apr 19, 2011·5 cites·12 claims
- 3476US7213226B2Pattern dimension correction method and verification method using OPC, mask and semiconductor device fabricated by using the correction method, and system and software product for executing the correction methodTOSHIBA KK·Filed 2004·Granted May 1, 2007·14 cites·20 claims
- 3575US8865589B2Semiconductor device and manufacturing method of semiconductor deviceHASHIMOTO TAKAKI·Filed 2012·Granted Oct 21, 2014·4 cites·7 claims
- 3675US7793252B2Mask pattern preparation method, semiconductor device manufacturing method and recording mediumTOSHIBA KK·Filed 2008·Granted Sep 7, 2010·3 cites·12 claims
- 3775US7716617B2Semiconductor device, method for making pattern layout, method for making mask pattern, method for making layout, method for manufacturing photo mask, photo mask, and method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2005·Granted May 11, 2010·7 cites·9 claims
- 3875US7631287B2Calculating method, verification method, verification program and verification system for edge deviation quantity, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2007·Granted Dec 8, 2009·3 cites·6 claims
- 3975US7065739B2Pattern correction method of semiconductor deviceTOSHIBA KK·Filed 2002·Granted Jun 20, 2006·12 cites·10 claims
- 4074US7996794B2Mask data processing method for optimizing hierarchical structureTOSHIBA KK·Filed 2007·Granted Aug 9, 2011·8 cites·5 claims
- 4174US7794897B2Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing methodTOSHIBA KK·Filed 2005·Granted Sep 14, 2010·3 cites·14 claims
- 4273US8108824B2Pattern verification method, method of manufacturing semiconductor device, and recording mediaKOTANI TOSHIYA·Filed 2009·Granted Jan 31, 2012·3 cites·20 claims
- 4373US7713833B2Method for manufacturing semiconductor deviceTOSHIBA KK·Filed 2009·Granted May 11, 2010·4 cites·12 claims
- 4473US7560197B2Mask pattern data producing method, patterning method, reticle correcting method, reticle manufacturing method, and semiconductor apparatus manufacturing methodTOSHIBA KK·Filed 2005·Granted Jul 14, 2009·3 cites·8 claims
- 4572US7998642B2Mask pattern data creation method and maskTOSHIBA KK·Filed 2009·Granted Aug 16, 2011·3 cites·15 claims
- 4672US6221539B1Mask pattern correction method and a recording medium which records a mask pattern correction programTOSHIBA KK·Filed 1999·Granted Apr 24, 2001·30 cites·14 claims
- 4771US8143171B2Method for manufacturing semiconductor device and computer readable medium for storing pattern size setting programMASHITA HIROMITSU·Filed 2009·Granted Mar 27, 2012·3 cites·6 claims
- 4871US7090949B2Method of manufacturing a photo mask and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 2003·Granted Aug 15, 2006·14 cites·16 claims
- 4970US9977855B2Method of wiring layout, semiconductor device, program for supporting design of wiring layout, and method for manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2014·Granted May 22, 2018·2 cites·21 claims
- 5069US8142961B2Mask pattern correcting method, mask pattern inspecting method, photo mask manufacturing method, and semiconductor device manufacturing methodKOTANI TOSHIYA·Filed 2010·Granted Mar 27, 2012·2 cites·16 claims
Showing the top 50 of 131 patent records by PatentIndex Score.
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