Inventor · disambiguated record
Charles L. Turner
Also filed as: TURNER CHARLES · TURNER CHARLES L · TURNER CHARLES LAMAR
17 granted patents·556 citations·filing 1973–2001
95Inventor score
Top patents by PatentIndex Score
17 records- 0193US5444013AMethod of forming a capacitorMICRON TECHNOLOGY INC·Filed 1994·Granted Aug 22, 1995·173 cites·28 claims
- 0288US5885869AMethod for uniformly doping hemispherical grain polycrystalline siliconMICRON TECHNOLOGY INC·Filed 1995·Granted Mar 23, 1999·102 cites·16 claims
- 0377US3930522AStructural ceramic article and method of making sameGEN REFRACTORIES CO·Filed 1973·Granted Jan 6, 1976·23 cites·4 claims
- 0476US5917213ADepletion compensated polysilicon electrodesMICRON TECHNOLOGY INC·Filed 1997·Granted Jun 29, 1999·34 cites·8 claims
- 0574US5792700ASemiconductor processing method for providing large grain polysilicon filmsMICRON TECHNOLOGY INC·Filed 1996·Granted Aug 11, 1998·39 cites·11 claims
- 0670US5332689AMethod for depositing low bulk resistivity doped filmsMICRON TECHNOLOGY INC·Filed 1993·Granted Jul 26, 1994·47 cites·10 claims
- 0767US5208479AMethod of increasing capacitance of polycrystalline silicon devices by surface roughening and polycrystalline silicon devicesMICRON TECHNOLOGY INC·Filed 1992·Granted May 4, 1993·43 cites·25 claims
- 0864US5753558AMethod of forming a capacitorMICRON TECHNOLOGY INC·Filed 1997·Granted May 19, 1998·23 cites·9 claims
- 0959US6506645B2Depletion compensated polysilicon electrodesMICRON TECHNOLOGY INC·Filed 2001·Granted Jan 14, 2003·6 cites·9 claims
- 1054US6048781ASemiconductor processing method for providing large grain polysilicon filmsMICRON TECHNOLOGY INC·Filed 1998·Granted Apr 11, 2000·16 cites·1 claims
- 1154US5491107ASemiconductor processing method for providing large grain polysilicon filmsMICRON TECHNOLOGY INC·Filed 1995·Granted Feb 13, 1996·19 cites·16 claims
- 1250US4021134AExtrusion die and cutting tool for machining such a dieGEN REFRACTORIES CO·Filed 1975·Granted May 3, 1977·8 cites·6 claims
- 1347US5658818ASemiconductor processing method employing an angled sidewallMICRON TECHNOLOGY INC·Filed 1995·Granted Aug 19, 1997·11 cites·14 claims
- 1446US6333536B1Depletion compensated polysilicon electrodesMICRON TECHNOLOGY INC·Filed 2000·Granted Dec 25, 2001·1 cites·7 claims
- 1535US6180449B1Depletion compensated polysilicon electrodesMICRON TECHNOLOGY INC·Filed 1999·Granted Jan 30, 2001·3 cites·15 claims
- 1632US5409539ASlotted cantilever diffusion tube system with a temperature insulating baffle system and a distributed gas injector systemMICRON TECHNOLOGY INC·Filed 1993·Granted Apr 25, 1995·6 cites·23 claims
- 1724US6022784AMethod for manufacturing a semiconductor deviceMOTOROLA INC·Filed 1998·Granted Feb 8, 2000·2 cites·20 claims
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