Inventor · disambiguated record
Masataka Shiba
Also filed as: SHIBA MASATAKA
39 granted patents·1,192 citations·filing 1978–2005
98Inventor score
Top patents by PatentIndex Score
39 records- 0194US4668089AExposure apparatus and method of aligning exposure mask with workpieceHITACHI LTD·Filed 1984·Granted May 26, 1987·85 cites·22 claims
- 0293US4669875AForeign particle detecting method and apparatusHITACHI LTD·Filed 1983·Granted Jun 2, 1987·79 cites·20 claims
- 0392US5329333AExposure apparatus and methodHITACHI LTD·Filed 1992·Granted Jul 12, 1994·45 cites·48 claims
- 0492US5070488AOptical integrated circuit and optical apparatusFUKUSHIMA ATSUKO·Filed 1989·Granted Dec 3, 1991·108 cites·24 claims
- 0591US6456951B1Method and apparatus for processing inspection dataHITACHI LTD·Filed 2000·Granted Sep 24, 2002·58 cites·27 claims
- 0689US6485891B1Exposure apparatus and methodHITACHI LTD·Filed 2000·Granted Nov 26, 2002·21 cites·23 claims
- 0789US5153916AMethod and apparatus for detecting focal planeHITACHI LTD·Filed 1991·Granted Oct 6, 1992·76 cites·14 claims
- 0889US4819033AIllumination apparatus for exposureHITACHI LTD·Filed 1987·Granted Apr 4, 1989·55 cites·8 claims
- 0987US6542830B1Process control systemHITACHI LTD·Filed 1997·Granted Apr 1, 2003·93 cites·25 claims
- 1086US4676637AExposure apparatus with foreign particle detectorHITACHI LTD·Filed 1985·Granted Jun 30, 1987·44 cites·9 claims
- 1185US7277155B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2005·Granted Oct 2, 2007·4 cites·11 claims
- 1285US6002989ASystem for quality control where inspection frequency of inspection apparatus is reset to minimize expected total loss based on derived frequency function and loss valueHITACHI LTD·Filed 1997·Granted Dec 14, 1999·84 cites·25 claims
- 1383US6757621B2Process management systemHITACHI LTD·Filed 2003·Granted Jun 29, 2004·35 cites·10 claims
- 1483US5008702AExposure method and apparatusHITACHI LTD·Filed 1989·Granted Apr 16, 1991·33 cites·46 claims
- 1576US6016187AExposure apparatus and methodHITACHI LTD·Filed 1998·Granted Jan 18, 2000·20 cites·17 claims
- 1676US5767949AExposure apparatus and methodHITACHI LTD·Filed 1996·Granted Jun 16, 1998·20 cites·12 claims
- 1776US5409538AControlling method of forming thin film, system for said controlling method, exposure method and system for said exposure methodHITACHI LTD·Filed 1993·Granted Apr 25, 1995·26 cites·26 claims
- 1874US4906852AProjection alignment method and apparatusHITACHI LTD·Filed 1989·Granted Mar 6, 1990·23 cites·20 claims
- 1973US5747201AControlling method of forming thin film, system for said controlling method, exposure method and system for said exposure methodHITACHI LTD·Filed 1995·Granted May 5, 1998·28 cites·13 claims
- 2070US6650409B1Semiconductor device producing method, system for carrying out the same and semiconductor work processing apparatus included in the same systemHITACHI LTD·Filed 1996·Granted Nov 18, 2003·39 cites·49 claims
- 2170US6335146B1Exposure apparatus and methodHITACHI LTD·Filed 2000·Granted Jan 1, 2002·5 cites·16 claims
- 2269US6334097B1Method of determining lethality of defects in circuit pattern inspection method of selecting defects to be reviewed and inspection system of circuit patterns involved with the methodsHITACHI LTD·Filed 1999·Granted Dec 25, 2001·29 cites·38 claims
- 2369US5526094AExposure apparatus and methodHITACHI LTD·Filed 1994·Granted Jun 11, 1996·11 cites·31 claims
- 2466US4458302AReflection type optical focusing apparatusHITACHI LTD·Filed 1982·Granted Jul 3, 1984·19 cites·14 claims
- 2565US4725737AAlignment method and apparatus for reduction projection type alignerHITACHI LTD·Filed 1985·Granted Feb 16, 1988·17 cites·15 claims
- 2664US6556955B2Method of determining lethality of defects in circuit pattern inspection, method of selecting defects to be reviewed, and inspection system of circuit patterns involved with the methodsHITACHI LTD·Filed 2001·Granted Apr 29, 2003·7 cites·14 claims
- 2764US5195070AOptical information processing apparatus and optical pickup thereforHITACHI LTD·Filed 1990·Granted Mar 16, 1993·15 cites·48 claims
- 2862US5121449AInformation detecting system of scanning typeHITACHI LTD·Filed 1990·Granted Jun 9, 1992·25 cites·25 claims
- 2958US7012671B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2002·Granted Mar 14, 2006·2 cites·18 claims
- 3058US4993837AMethod and apparatus for pattern detectionHITACHI LTD·Filed 1989·Granted Feb 19, 1991·12 cites·35 claims
- 3157US5191624AOptical information storing apparatus and method for production of optical deflectorHITACHI LTD·Filed 1991·Granted Mar 2, 1993·22 cites·18 claims
- 3257US4795261AReduction projection type alignerHITACHI LTD·Filed 1986·Granted Jan 3, 1989·12 cites·8 claims
- 3357US4701050ASemiconductor exposure apparatus and alignment method thereforHITACHI LTD·Filed 1985·Granted Oct 20, 1987·12 cites·12 claims
- 3455US7604925B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2005·Granted Oct 20, 2009·0 cites·10 claims
- 3555US4178472AVoiced instruction identification systemFUNAKUBO HIROYASU·Filed 1978·Granted Dec 11, 1979·11 cites·12 claims
- 3654US7598020B2Exposure apparatus and methodRENESAS TECH CORP·Filed 2005·Granted Oct 6, 2009·0 cites·10 claims
- 3752US4777374APattern position detecting method and apparatus for detecting the position of an alignment direction of a wafer target patternHITACHI LTD·Filed 1986·Granted Oct 11, 1988·10 cites·10 claims
- 3837US5324953AReduced-projection exposure system with chromatic aberration correction system including diffractive lens such as holographic lensHITACHI LTD·Filed 1993·Granted Jun 28, 1994·4 cites·3 claims
- 3932US5187756ASurface acoustic waveguide device and manufacturing methodHITACHI LTD·Filed 1991·Granted Feb 16, 1993·3 cites·11 claims
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