Inventor · disambiguated record
Chung-Ta Cheng
Also filed as: CHENG CHUNG-TA
7 granted patents·6 pending applications·47 citations·filing 2001–2023
82Inventor score
Files withIND TECH RES INST5HON HAI PREC IND CO LTD4CHIANG DONYAU1IND TECHNLOGY RES INST1VMWARE INC1
Top patents by PatentIndex Score
13 records- 0189US7465530B1Inorganic resist material and nano-fabrication method by utilizing the sameIND TECH RES INST·Filed 2008·Granted Dec 16, 2008·14 cites·30 claims
- 0273US8540888B1Methods of patterning layered-material and forming imprinting moldYANG CHIN-TIEN·Filed 2012·Granted Sep 24, 2013·4 cites·14 claims
- 0358US6739883B1Cable end connector assemblyHON HAI PREC IND CO LTD·Filed 2003·Granted May 25, 2004·11 cites·3 claims
- 0457USD493144SCable assemblyHON HAI PREC IND CO LTD·Filed 2003·Granted Jul 20, 2004·10 cites·1 claims
- 0553US2024378092A1Cloud native network function deploymentVMWARE INC·Filed 2023·Application pending·0 cites
- 0652US7781044B2Organic compound for recording layer for high speed recording of information and optical recording medium including the sameIND TECH RES INST·Filed 2007·Granted Aug 24, 2010·0 cites·18 claims
- 0750US2010086724A1Organic dye compound and high density optical recording medium including the sameIND TECH RES INST·Filed 2009·Application pending·0 cites
- 0849US2009087620A1Organic compounds for recording layer for recording of information and optical recording medium including the sameIND TECH RES INST·Filed 2007·Application pending·0 cites
- 0948US6577278B1Dual band antenna with bending structureHON HAI PREC IND CO LTD·Filed 2001·Granted Jun 10, 2003·7 cites·18 claims
- 1048US2010047509A1Organic dye compound and high density optical recording medium including the sameIND TECH RES INST·Filed 2008·Application pending·0 cites
- 1147US2011053094A1Method for fabricating roller mold for nanoimprintingIND TECHNLOGY RES INST·Filed 2009·Application pending·0 cites
- 1239US6577277B1Dual band antennaHON HAI PREC IND CO LTD·Filed 2001·Granted Jun 10, 2003·1 cites·20 claims
- 1336US2013140269A1Method and mechanism of photoresist layer structure used in manufacturing nano scale patternsCHIANG DONYAU·Filed 2012·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →