Inventor · disambiguated record
Yoshikazu Tanabe
Also filed as: TANABE YOSHIKAZU
56 granted patents·3 pending applications·889 citations·filing 1989–2014
99Inventor score
Top patents by PatentIndex Score
59 records- 0192US7247921B2Semiconductor apparatus and method of manufacturing same, and method of detecting defects in semiconductor apparatusTOSHIBA KK·Filed 2005·Granted Jul 24, 2007·25 cites·15 claims
- 0292US7053007B2Method for fabricating semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2005·Granted May 30, 2006·10 cites·21 claims
- 0391US6894302B2Surface inspection apparatus and method thereofHITACHI HIGH TECH ELECT ENG CO·Filed 2001·Granted May 17, 2005·35 cites·7 claims
- 0491US6593229B1Semiconductor integrated circuit device and method for manufacturing the sameHITACHI LTD·Filed 2000·Granted Jul 15, 2003·45 cites·7 claims
- 0589US7242016B2Surface inspection apparatus and method thereofHITACHI HIGH TECH CORP·Filed 2005·Granted Jul 10, 2007·11 cites·15 claims
- 0689US6784116B2Fabrication process of a semiconductor integrated circuit deviceHITACHI LTD·Filed 2003·Granted Aug 31, 2004·29 cites·23 claims
- 0788US7417244B2Surface inspection apparatus and method thereofHITACHI LTD·Filed 2007·Granted Aug 26, 2008·9 cites·18 claims
- 0888US6503819B2Fabrication process of a semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Jan 7, 2003·27 cites·34 claims
- 0988US6323115B1Method of forming semiconductor integrated circuit device with dual gate CMOS structureHITACHI LTD·Filed 1999·Granted Nov 27, 2001·54 cites·40 claims
- 1088US6197702B1Fabrication process of a semiconductor integrated circuit deviceHITACHI LTD·Filed 1998·Granted Mar 6, 2001·59 cites·26 claims
- 1187US6066508AProcess for manufacturing semiconductor integrated circuit device including treatment of gas used in the processHITACHI LTD·Filed 1998·Granted May 23, 2000·43 cites·22 claims
- 1285US6528431B2Method for fabricating semiconductor integrated circuit drive using an oxygen and hydrogen catalystHITACHI LTD·Filed 2001·Granted Mar 4, 2003·17 cites·15 claims
- 1384US7952085B2Surface inspection apparatus and method thereofHITACHI LTD·Filed 2008·Granted May 31, 2011·6 cites·17 claims
- 1484US6737341B1Semiconductor integrated circuit device and method for manufacturing the sameRENESAS TECH CORP·Filed 2000·Granted May 18, 2004·27 cites·26 claims
- 1584US6239041B1Method for fabricating semiconductor integrated circuit deviceHITACHI LTD·Filed 1998·Granted May 29, 2001·36 cites·29 claims
- 1684US5670808AMetal oxide capacitor with a WNX electrodeTOSHIBA KK·Filed 1996·Granted Sep 23, 1997·50 cites·6 claims
- 1782US6569780B2Method for fabricating semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted May 27, 2003·13 cites·29 claims
- 1881US7250376B2Method for fabricating semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2005·Granted Jul 31, 2007·3 cites·20 claims
- 1980US8517591B2Liquid crystal display deviceNAKAMOTO HIROSHI·Filed 2009·Granted Aug 27, 2013·10 cites·13 claims
- 2080US7122469B2Fabrication process of a semiconductor integrated circuit deviceHITACHI LTD·Filed 2005·Granted Oct 17, 2006·4 cites·6 claims
- 2180US6733732B2Reactor for generating moistureFUJIKIN KK·Filed 2001·Granted May 11, 2004·21 cites·23 claims
- 2279US6521550B2Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the processHITACHI LTD·Filed 2001·Granted Feb 18, 2003·14 cites·23 claims
- 2378US4932567AContainer for foamy liquid discharged in small amountsKOATSU KAKO·Filed 1989·Granted Jun 12, 1990·51 cites·3 claims
- 2477US6855642B2Method for fabricating semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2003·Granted Feb 15, 2005·9 cites·4 claims
- 2577US5929473AMMIC semiconductor device with WNx capacitor electrodeTOSHIBA KK·Filed 1997·Granted Jul 27, 1999·37 cites·8 claims
- 2676US6093662AMethod for generating water for semiconductor productionFUJIKIN KK·Filed 1998·Granted Jul 25, 2000·35 cites·7 claims
- 2775US6528403B2Fabrication process of a semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Mar 4, 2003·11 cites·3 claims
- 2873US6417114B2Method for fabricating semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Jul 9, 2002·7 cites·22 claims
- 2972US7799690B2Method for fabricating semiconductor integrated circuit deviceRENESAS ELECTRONICS CORP·Filed 2007·Granted Sep 21, 2010·1 cites·10 claims
- 3072US6319860B1Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the processHITACHI LTD·Filed 2000·Granted Nov 20, 2001·9 cites·35 claims
- 3171US7084708B2High-frequency amplification deviceTOSHIBA KK·Filed 2004·Granted Aug 1, 2006·18 cites·12 claims
- 3271US6596650B2Method for fabricating semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Jul 22, 2003·6 cites·67 claims
- 3370US6518202B2Method for fabricating semiconductor integrated circuit deviceHITACHI LTD·Filed 2001·Granted Feb 11, 2003·6 cites·22 claims
- 3469US7053459B2Semiconductor integrated circuit device and process for producing the sameRENESAS TECH CORP·Filed 2001·Granted May 30, 2006·12 cites·6 claims
- 3569US6723665B2Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the processRENESAS TECH CORP·Filed 2003·Granted Apr 20, 2004·8 cites·7 claims
- 3669US6403475B1Fabrication method for semiconductor integrated deviceHITACHI LTD·Filed 2000·Granted Jun 11, 2002·13 cites·19 claims
- 3768US6790694B2High frequency semiconductor module, high frequency semiconductor device and manufacturing method for the sameTOSHIBA KK·Filed 2002·Granted Sep 14, 2004·12 cites·6 claims
- 3866US6987069B2Fabrication process of a semiconductor integrated circuit deviceHITACHI LTD·Filed 2004·Granted Jan 17, 2006·6 cites·6 claims
- 3966US6936550B2Semiconductor integrated circuit device and method for manufacturing the sameHITACHI LTD·Filed 2004·Granted Aug 30, 2005·9 cites·13 claims
- 4065US7375013B2Semiconductor integrated circuit device and process for manufacturing the sameRENESAS TECH CORP·Filed 2006·Granted May 20, 2008·2 cites·33 claims
- 4165US6602808B2Process for manufacturing semiconductor integrated circuit device including treatment of gas used in the processHITACHI LTD·Filed 2001·Granted Aug 5, 2003·6 cites·7 claims
- 4265US6518201B1Method for fabricating semiconductor integrated circuit deviceHITACHI LTD·Filed 2000·Granted Feb 11, 2003·4 cites·30 claims
- 4364US9551670B2Surface inspection apparatus and method thereofHITACHI HIGH TECH CORP·Filed 2014·Granted Jan 24, 2017·0 cites·11 claims
- 4464US6784038B2Process for producing semiconductor integrated circuit device and semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2001·Granted Aug 31, 2004·8 cites·2 claims
- 4562US6180067B1Reactor for the generation of waterFUJIKIN KK·Filed 1998·Granted Jan 30, 2001·23 cites·12 claims
- 4658US7008880B2Method for fabricating semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2004·Granted Mar 7, 2006·2 cites·9 claims
- 4757US6334962B1Low flow rate moisture supply processFUJIKIN KK·Filed 1998·Granted Jan 1, 2002·21 cites·5 claims
- 4855US8729514B2Surface inspection apparatus and method thereofISHIMARU ICHIRO·Filed 2011·Granted May 20, 2014·0 cites·19 claims
- 4955US8502935B2Liquid crystal display device comprising a light guide plate with a light radiation portion and a light incident portion joined by a joint surface and having an inclined surface and projecting portionsNAKAMOTO HIROSHI·Filed 2008·Granted Aug 6, 2013·2 cites·15 claims
- 5054US6962881B2Method for fabricating semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2004·Granted Nov 8, 2005·1 cites·33 claims
Showing the top 50 of 59 patent records by PatentIndex Score.
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