Inventor · disambiguated record
Tamotsu Watanabe
Also filed as: WATANABE TAMOTSU
15 granted patents·8 pending applications·138 citations·filing 1988–2017
92Inventor score
Top patents by PatentIndex Score
23 records- 0196US9075306B2Chemically amplified negative resist composition and patterning processTAKEDA TAKANOBU·Filed 2011·Granted Jul 7, 2015·22 cites·8 claims
- 0295US8343694B2Photomask blank, resist pattern forming process, and photomask preparation processSHINETSU CHEMICAL CO·Filed 2011·Granted Jan 1, 2013·11 cites·6 claims
- 0392US7977027B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 12, 2011·15 cites·3 claims
- 0491US7762614B2Glass runTOYODA GOSEI KK·Filed 2007·Granted Jul 27, 2010·17 cites·5 claims
- 0582US7501223B2Polymer, resist composition and patterning process using the sameSHINETSU CHEMICAL CO·Filed 2007·Granted Mar 10, 2009·20 cites·23 claims
- 0678US8110335B2Resist patterning process and manufacturing photo maskTAKEDA TAKANOBU·Filed 2009·Granted Feb 7, 2012·6 cites·9 claims
- 0775US6777453B1Method of reclaiming crosslinked rubber, and molded article of reclaimed rubberTOYODA CHUO KENKYUSHO KK·Filed 2000·Granted Aug 17, 2004·14 cites·18 claims
- 0872US6632918B1Method of reclaiming crosslinked rubberTOYODA CHUO KENKYUSHO KK·Filed 2000·Granted Oct 14, 2003·12 cites·14 claims
- 0961US7476275B2Coating machineTOYODA GOSEI KK·Filed 2006·Granted Jan 13, 2009·3 cites·4 claims
- 1059US8578587B2Method of producing a weather stripHOTTA MASATOSHI·Filed 2011·Granted Nov 12, 2013·2 cites·9 claims
- 1159US2009039672A1Glass run and manufacturing method thereofTOYODA GOSEI KK·Filed 2008·Application pending·0 cites
- 1258US7914355B2Method of manufacturing display apparatus with SAW touch sensorPIONEER TOHOKU CORP·Filed 2006·Granted Mar 29, 2011·1 cites·2 claims
- 1357US4876158APiston ring having a wear resistant surface layerKABUSHIKIKAISHA RIKEN·Filed 1988·Granted Oct 24, 1989·15 cites·2 claims
- 1457US2014053469A1Glass run with deviation prevention portionTOYODA GOSEI KK·Filed 2013·Application pending·0 cites
- 1555US8367295B2Preparation process of chemically amplified resist compositionSHINETSU CHEMICAL CO·Filed 2008·Granted Feb 5, 2013·0 cites·7 claims
- 1654US2008305411A1Photomask blank, resist pattern forming process, and photomask preparation processSHINETSU CHEMICAL CO·Filed 2008·Application pending·0 cites
- 1754US2008241751A1Chemically amplified negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2008·Application pending·0 cites
- 1853US2008110102A1Weather strip and production method for the sameTOYODA GOSEI KK·Filed 2007·Application pending·0 cites
- 1947US8193307B2Synthesis of photoresist polymerTAKEDA TAKANOBU·Filed 2008·Granted Jun 5, 2012·0 cites·9 claims
- 2044US2007111139A1Negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Application pending·0 cites
- 2142US2006166133A1Negative resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2006·Application pending·0 cites
- 2237US8394577B2Patterning processTANAKA AKINOBU·Filed 2010·Granted Mar 12, 2013·0 cites·11 claims
- 2332US2019269935A1Hair restoration/growth stimulation deviceADERANS KK·Filed 2017·Application pending·0 cites
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