Inventor · disambiguated record
Kazuo Ushida
Also filed as: USHIDA KAZUO
24 granted patents·2 pending applications·926 citations·filing 1981–2003
97Inventor score
Top patents by PatentIndex Score
26 records- 0196US4931830AProjection exposure apparatusNIKON CORP·Filed 1989·Granted Jun 5, 1990·108 cites·19 claims
- 0295US6750952B2Apparatus for preforming measurement of a dimension of a test mark for semiconductor processingNIKON PREC INC·Filed 2002·Granted Jun 15, 2004·63 cites·32 claims
- 0395US5883704AProjection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical systemNIKON CORP·Filed 1996·Granted Mar 16, 1999·183 cites·46 claims
- 0493US4734746AExposure method and system for photolithographyNIPPON KOGAKU KK·Filed 1987·Granted Mar 29, 1988·72 cites·19 claims
- 0590US6262793B1Method of manufacturing and using correction member to correct aberration in projection exposure apparatusNIKON CORP·Filed 1994·Granted Jul 17, 2001·55 cites·31 claims
- 0687US4965630AProjection exposure apparatusNIKON CORP·Filed 1989·Granted Oct 23, 1990·50 cites·8 claims
- 0786US6049374AIllumination apparatus, a projection exposure apparatus having the same, a method of manufacturing a device using the same, and a method of manufacturing the projection exposure apparatusNIKON CORP·Filed 1998·Granted Apr 11, 2000·61 cites·40 claims
- 0886US5636000AProjection optical system and projection exposure apparatus using the sameNIKON CORP·Filed 1995·Granted Jun 3, 1997·62 cites·12 claims
- 0982US6449031B1Method for use of a critical dimensional test structureNIKON CORP·Filed 2000·Granted Sep 10, 2002·17 cites·13 claims
- 1080USRE38320EProjection exposure apparatus wherein focusing of the apparatus is changed by controlling the temperature of a lens element of the projection optical systemNIPPON KOGAKU KK·Filed 2001·Granted Nov 18, 2003·20 cites·59 claims
- 1177US5805344AProjection optical system and projection exposure apparatusNIKON CORP·Filed 1996·Granted Sep 8, 1998·34 cites·76 claims
- 1276US6094256AMethod for forming a critical dimension test structure and its useNIKON PRECISION INC·Filed 1998·Granted Jul 25, 2000·29 cites·17 claims
- 1375US5311362AProjection exposure apparatusNIKON CORP·Filed 1993·Granted May 10, 1994·28 cites·9 claims
- 1474US6958803B2Projection exposure apparatus and method with adjustment of rotationally asymmetric optical characteristicsNIKON CORP·Filed 2003·Granted Oct 25, 2005·10 cites·116 claims
- 1573US5943172AProjection optical system and projection exposure apparatusNIKON CORP·Filed 1997·Granted Aug 24, 1999·34 cites·48 claims
- 1670US5831776AProjection optical system and projection exposure apparatusNIKON CORP·Filed 1997·Granted Nov 3, 1998·38 cites·55 claims
- 1764US5530518AProjection exposure apparatusNIKON CORP·Filed 1994·Granted Jun 25, 1996·15 cites·25 claims
- 1853US5754340AProjection optical system and projection exposure apparatus using the sameNIKON CORP·Filed 1995·Granted May 19, 1998·16 cites·15 claims
- 1953US5576801AProjection exposure apparatusNIKON CORP·Filed 1995·Granted Nov 19, 1996·12 cites·8 claims
- 2052US4403835AObjective lens for microscopeNIPPON KOGAKU KK·Filed 1981·Granted Sep 13, 1983·12 cites·12 claims
- 2150USRE38403EProjection optical system and projection exposure apparatusNIPPON KOGAKU KK·Filed 2000·Granted Jan 27, 2004·2 cites·207 claims
- 2248US6610460B2Exposure methodNIKON CORP·Filed 2002·Granted Aug 26, 2003·2 cites·15 claims
- 2339US2002054282A1Projection exposure apparatusNIKON CORP·Filed 2002·Application pending·0 cites
- 2436US2005159365A1Hepatits c virus inhibitor comprising alpha-glycosylceramide as the active ingredientKIRIN BREWERY·Filed 2003·Application pending·0 cites
- 2532US4592624AObjective lens for microscope of low magnificationNIPPON KOGAKU KK·Filed 1984·Granted Jun 3, 1986·2 cites·11 claims
- 2631USRE39662EProjection exposure apparatusNIPPON KOGAKU KK·Filed 1999·Granted May 29, 2007·1 cites·82 claims
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