Inventor · disambiguated record
Vlasta Brusic Kaufman
Also filed as: KAUFMAN VLASTA BRUSIC
21 granted patents·2,300 citations·filing 1996–2005
97Inventor score
Top patents by PatentIndex Score
21 records- 0199US5954997AChemical mechanical polishing slurry useful for copper substratesCABOT CORP·Filed 1996·Granted Sep 21, 1999·480 cites·25 claims
- 0297US6063306AChemical mechanical polishing slurry useful for copper/tantalum substrateCABOT CORP·Filed 1998·Granted May 16, 2000·372 cites·34 claims
- 0397US5783489AMulti-oxidizer slurry for chemical mechanical polishingCABOT CORP·Filed 1996·Granted Jul 21, 1998·263 cites·38 claims
- 0496US6217416B1Chemical mechanical polishing slurry useful for copper/tantalum substratesCABOT MICROELECTRONICS CORP·Filed 1998·Granted Apr 17, 2001·202 cites·11 claims
- 0596US5858813AChemical mechanical polishing slurry for metal layers and filmsCABOT CORP·Filed 1996·Granted Jan 12, 1999·320 cites·55 claims
- 0693US6126853AChemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 1997·Granted Oct 3, 2000·116 cites·20 claims
- 0792US6620037B2Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 2002·Granted Sep 16, 2003·80 cites·28 claims
- 0892US6316366B1Method of polishing using multi-oxidizer slurryCABOT MICROELECTRONICS CORP·Filed 2000·Granted Nov 13, 2001·36 cites·7 claims
- 0990US6852632B2Method of polishing a multi-layer substrateCABOT MICROELECTRONICS CORP·Filed 2003·Granted Feb 8, 2005·33 cites·34 claims
- 1090US6039891AMulti-oxidizer precursor for chemical mechanical polishingCABOT CORP·Filed 1997·Granted Mar 21, 2000·57 cites·2 claims
- 1186US6840971B2Chemical mechanical polishing systems and methods for their useCABOT MICROELECTRONICS CORP·Filed 2002·Granted Jan 11, 2005·30 cites·12 claims
- 1286US6033596AMulti-oxidizer slurry for chemical mechanical polishingCABOT CORP·Filed 1997·Granted Mar 7, 2000·52 cites·3 claims
- 1385US6432828B2Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 1998·Granted Aug 13, 2002·58 cites·19 claims
- 1485US6362106B1Chemical mechanical polishing method useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 2000·Granted Mar 26, 2002·25 cites·12 claims
- 1584US6855266B1Polishing system with stopping compound and method of its useCABOT MICROELECTRONICS CORP·Filed 2000·Granted Feb 15, 2005·26 cites·25 claims
- 1684US6569350B2Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 2002·Granted May 27, 2003·23 cites·41 claims
- 1783US6593239B2Chemical mechanical polishing method useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 1999·Granted Jul 15, 2003·56 cites·21 claims
- 1880US6867140B2Method of polishing a multi-layer substrateCABOT MICROELECTRONICS CORP·Filed 2003·Granted Mar 15, 2005·20 cites·21 claims
- 1973US6309560B1Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 1997·Granted Oct 30, 2001·41 cites·19 claims
- 2070US7354530B2Chemical mechanical polishing systems and methods for their useWANG SHUMIN·Filed 2005·Granted Apr 8, 2008·3 cites·9 claims
- 2165US7381648B2Chemical mechanical polishing slurry useful for copper substratesCABOT MICROELECTRONICS CORP·Filed 2003·Granted Jun 3, 2008·7 cites·18 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →