Inventor · disambiguated record
Roland Gesche
Also filed as: GESCHE ROLAND · GESCHE ROLAND DR
23 granted patents·6 pending applications·464 citations·filing 1989–2022
95Inventor score
Files withLEYBOLD AG15GESCHE ROLAND7FORSCHUNGSVERBUND BERLIN EV2AURION ANLAGENTECHNIK GMBH1KRONES AG1
Top patents by PatentIndex Score
29 records- 0195US5140223ACircuit for adjusting the impedance of a plasma section to a high-frequency generatorLEYBOLD AG·Filed 1989·Granted Aug 18, 1992·98 cites·5 claims
- 0293US5146137ADevice for the generation of a plasmaLEYBOLD AG·Filed 1990·Granted Sep 8, 1992·114 cites·17 claims
- 0383US5558751ADual cathode sputter coating apparatusLEYBOLD AG·Filed 1995·Granted Sep 24, 1996·43 cites·3 claims
- 0482US8545764B2Microplasma arrayGESCHE ROLAND·Filed 2006·Granted Oct 1, 2013·7 cites·17 claims
- 0582US5538610AVacuum coating systemLEYBOLD AG·Filed 1995·Granted Jul 23, 1996·54 cites·8 claims
- 0682US5053725ACircuit configuration for the automatic tuning of a matching networkLEYBOLD AG·Filed 1989·Granted Oct 1, 1991·33 cites·21 claims
- 0766US5025135ACircuit configuration for the recognition of a plasmaLEYBOLD AG·Filed 1989·Granted Jun 18, 1991·26 cites·8 claims
- 0862US12176201B2Plasma light engineGESCHE ROLAND·Filed 2022·Granted Dec 24, 2024·0 cites·35 claims
- 0962US5397448ADevice for generating a plasma by means of cathode sputtering and microwave-irradiationLEYBOLD AG·Filed 1993·Granted Mar 14, 1995·15 cites·9 claims
- 1060US9210792B2Method and apparatus for generating plasma pulsesFORSCHUNGSVERBUND BERLIN EV·Filed 2013·Granted Dec 8, 2015·1 cites·9 claims
- 1157US5538609ACathodic sputtering systemLEYBOLD AG·Filed 1995·Granted Jul 23, 1996·14 cites·2 claims
- 1257US5485802AMethod and apparatus for pulling monocrystals from a meltLEYBOLD AG·Filed 1994·Granted Jan 23, 1996·14 cites·12 claims
- 1356US8324971B2Self-adjusting gate bias network for field effect transistorsGESCHE ROLAND·Filed 2009·Granted Dec 4, 2012·2 cites·12 claims
- 1455US5124526AIon sourceLEYBOLD AG·Filed 1991·Granted Jun 23, 1992·14 cites·9 claims
- 1553US2013209704A1Power lance and plasma-enhanced coating with high frequency couplingKRONES AG·Filed 2013·Application pending·0 cites
- 1651US2016093475A1Method and apparatus for generating plasma pulsesFORSCHUNGSVERBUND BERLIN EV·Filed 2015·Application pending·0 cites
- 1749US5531877AMicrowave-enhanced sputtering configurationLEYBOLD AG·Filed 1993·Granted Jul 2, 1996·12 cites·8 claims
- 1847US5237152AApparatus for thin-coating processes for treating substrates of great surface areaLEYBOLD AG·Filed 1991·Granted Aug 17, 1993·9 cites·5 claims
- 1947US2011006687A1Method and generator circuit for production of plasma by means of radio-frequency excitationAURION ANLAGENTECHNIK GMBH·Filed 2008·Application pending·0 cites
- 2037US5034577AFluid actuated electrical switchLEYBOLD AG·Filed 1989·Granted Jul 23, 1991·3 cites·9 claims
- 2137US2012018096A1Process chamber having modulated plasma supplyGESCHE ROLAND·Filed 2010·Application pending·0 cites
- 2236US8339047B2Electrode for a plasma generatorGESCHE ROLAND·Filed 2008·Granted Dec 25, 2012·0 cites·11 claims
- 2336US5049840ACooling device for electrical circuit configurationsLEYBOLD AG·Filed 1989·Granted Sep 17, 1991·5 cites·4 claims
- 2430US2013213576A1Plasma processes at atmospheric pressureGESCHE ROLAND·Filed 2011·Application pending·0 cites
- 2529US9100113B2Auto-heterodyne receiverKÜHN SILVIO·Filed 2012·Granted Aug 4, 2015·0 cites·10 claims
- 2629US5087800AHigh frequency, large current, switch including a pressure-actuated current-carrying extensible bellows elementLEYBOLD AG·Filed 1991·Granted Feb 11, 1992·0 cites·23 claims
- 2729US2013328483A1Microwave icp resonatorGESCHE ROLAND·Filed 2011·Application pending·0 cites
- 2827US9210789B2Device and method for generating a plasma by means of a traveling wave resonatorPORTEANU HORIA-EUGEN·Filed 2010·Granted Dec 8, 2015·0 cites·12 claims
- 2925US8796934B2Miniaturizable plasma sourceKUEHN SILVIO·Filed 2011·Granted Aug 5, 2014·0 cites·13 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →