Inventor · disambiguated record
Masahiko Kaminishi
Also filed as: KAMINISHI MASAHIKO
10 granted patents·1 pending application·31 citations·filing 2006–2024
83Inventor score
Files withTOKYO ELECTRON LTD11
Top patents by PatentIndex Score
11 records- 0192US9929008B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2015·Granted Mar 27, 2018·12 cites·19 claims
- 0285US8962495B2Film deposition methodTOKYO ELECTRON LTD·Filed 2013·Granted Feb 24, 2015·9 cites·3 claims
- 0380US8354135B2Thermal processing apparatus, method for regulating temperature of thermal processing apparatus, and programTOKYO ELECTRON LTD·Filed 2009·Granted Jan 15, 2013·4 cites·8 claims
- 0473US8987147B2Method of depositing a film using a turntable apparatusTOKYO ELECTRON LTD·Filed 2013·Granted Mar 24, 2015·3 cites·10 claims
- 0569US9252043B2Film deposition methodTOKYO ELECTRON LTD·Filed 2013·Granted Feb 2, 2016·2 cites·8 claims
- 0657US8778812B2Apparatus and method of forming thin film including adsorption step and reaction stepTOKYO ELECTRON LTD·Filed 2012·Granted Jul 15, 2014·1 cites·12 claims
- 0757US2025019815A1Film-forming method and film-forming apparatusTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0856US8980371B2Film deposition methodTOKYO ELECTRON LTD·Filed 2013·Granted Mar 17, 2015·0 cites·6 claims
- 0952US10053776B2Method of detoxifying exhaust pipe and film forming apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Aug 21, 2018·0 cites·12 claims
- 1051US7637268B2Film formation method and apparatus for semiconductor processTOKYO ELECTRON LTD·Filed 2006·Granted Dec 29, 2009·0 cites·10 claims
- 1147US10472719B2Nozzle and substrate processing apparatus using sameTOKYO ELECTRON LTD·Filed 2015·Granted Nov 12, 2019·0 cites·19 claims
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