Inventor · disambiguated record
Haruhiko Furuya
Also filed as: FURUYA HARUHIKO
9 granted patents·11 pending applications·18 citations·filing 2003–2025
81Inventor score
Top patents by PatentIndex Score
20 records- 0173US9136156B2Substrate processing apparatus and film deposition apparatusENOMOTO TADASHI·Filed 2012·Granted Sep 15, 2015·4 cites·8 claims
- 0273US9080238B2Raw material supplying device and film forming apparatusWAMURA YU·Filed 2011·Granted Jul 14, 2015·4 cites·9 claims
- 0368US12205800B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2022·Granted Jan 21, 2025·0 cites·15 claims
- 0465US2025389018A1Silicon carbonitride film-forming method and plasma processing apparatusTOKYO ELECTRON LTD·Filed 2025·Application pending·0 cites
- 0562US2023203651A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0661US2024194507A1Substrate processing apparatus, model data generation apparatus, substrate processing method, and model data generation methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0760US12165846B2Plasma processing apparatus and plasma processing methodTOKYO ELECTRON LTD·Filed 2021·Granted Dec 10, 2024·0 cites·12 claims
- 0859US12347649B2Plasma processing apparatus and lid memberTOKYO ELECTRON LTD·Filed 2022·Granted Jul 1, 2025·0 cites·17 claims
- 0957US8778812B2Apparatus and method of forming thin film including adsorption step and reaction stepTOKYO ELECTRON LTD·Filed 2012·Granted Jul 15, 2014·1 cites·12 claims
- 1055US2023207376A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1154US7041546B2Film forming method for depositing a plurality of high-k dielectric filmsTOKYO ELECTRON LTD·Filed 2003·Granted May 9, 2006·5 cites·4 claims
- 1254US2023128473A1Method of transporting workpiece and processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1353US7368384B2Film formation apparatus and method of using the sameTOKYO ELECTRON LTD·Filed 2005·Granted May 6, 2008·4 cites·13 claims
- 1453US2023080956A1Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 1553US2008226820A1Formation of metal oxide filmFURUYA HARUHIKO·Filed 2008·Application pending·0 cites
- 1652US8586140B2Film formation method for forming hafnium oxide filmFURUYA HARUHIKO·Filed 2011·Granted Nov 19, 2013·0 cites·20 claims
- 1742US2005272271A1Semiconductor processing method for processing substrate to be processed and its apparatusTOKYO ELECTRON LTD·Filed 2004·Application pending·0 cites
- 1842US2015221529A1Gas supply method and thermal treatment methodTOKYO ELECTRON LTD·Filed 2015·Application pending·0 cites
- 1939US2012288625A1Gas supply apparatus, thermal treatment apparatus, gas supply method, and thermal treatment methodFURUYA HARUHIKO·Filed 2012·Application pending·0 cites
- 2036US2010186667A1Vertical heat processing apparatus and component for same, for forming high dielectric constant filmTOKYO ELECTRON LTD·Filed 2010·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →