Inventor · disambiguated record
Thorsten Schedel
Also filed as: SCHEDEL THORSTEN
15 granted patents·5 pending applications·127 citations·filing 2001–2020
92Inventor score
Files withINFINEON TECHNOLOGIES AG8INFINEON TECHNOLOGIES SC3003ADVANCED MASK TECH CENTER GMBH & CO KG1BENDER MARKUS1BERGHOF VOLKER1
Top patents by PatentIndex Score
20 records- 0186US6684124B2Method for controlling a processing device for a sequential processing of semiconductor wafersINFINEON TECHNOLOGIES AG·Filed 2002·Granted Jan 27, 2004·40 cites·11 claims
- 0281US8097955B2Interconnect structures and methodsZIMMERMANN BERND·Filed 2008·Granted Jan 17, 2012·19 cites·14 claims
- 0378US7304716B2Method for purging an optical lensINFINEON TECHNOLOGIES AG·Filed 2005·Granted Dec 4, 2007·6 cites·24 claims
- 0475US6908775B2Method for performing an alignment measurement of two patterns in different layers on a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jun 21, 2005·20 cites·10 claims
- 0558US6593254B2Method for clamping a semiconductor device in a manufacturing processINFINEON TECHNOLOGIES SC300·Filed 2002·Granted Jul 15, 2003·9 cites·9 claims
- 0657US6806008B2Method for adjusting a temperature in a resist processINFINEON TECHNOLOGIES SC300·Filed 2002·Granted Oct 19, 2004·6 cites·5 claims
- 0754US6887722B2Method for exposing a semiconductor waferINFINEON TECHNOLOGIES SC300·Filed 2003·Granted May 3, 2005·6 cites·7 claims
- 0854US6780552B2Method for controlling the quality of a lithographic structuring stepINFINEON TECHNOLOGIES AG·Filed 2002·Granted Aug 24, 2004·5 cites·11 claims
- 0951US6979522B2Method for exposing at least one or at least two semiconductor wafersINFINEON TECHNOLOGIES AG·Filed 2003·Granted Dec 27, 2005·3 cites·14 claims
- 1051US6861331B2Method for aligning and exposing a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2003·Granted Mar 1, 2005·7 cites·10 claims
- 1149US6892108B2Method for adjusting processing parameters of at least one plate-shaped object in a processing toolMOTOROLA INC·Filed 2003·Granted May 10, 2005·2 cites·9 claims
- 1244US7186484B2Method for determining the relative positional accuracy of two structure elements on a waferINFINEON TECHNOLOGIES AG·Filed 2004·Granted Mar 6, 2007·3 cites·11 claims
- 1343US7248365B2Method for adjusting a substrate in an appliance for carrying out exposureINFINEON TECHNOLOGIES AG·Filed 2003·Granted Jul 24, 2007·1 cites·2 claims
- 1442US11537039B2Photomask assembly with reflective photomask and method of manufacturing a reflective photomaskADVANCED MASK TECH CENTER GMBH & CO KG·Filed 2020·Granted Dec 27, 2022·0 cites·9 claims
- 1540US2007005170A1Method for the preferred processing of workpieces of highest prioritySCHEDEL THORSTEN·Filed 2005·Application pending·0 cites
- 1639US10031409B2Reflective photomask and reflection-type mask blankBENDER MARKUS·Filed 2016·Granted Jul 24, 2018·0 cites·24 claims
- 1736US2009166848A1Method for Enhancing the Adhesion of a Passivation Layer on a Semiconductor DeviceBERGHOF VOLKER·Filed 2007·Application pending·0 cites
- 1835US2002051567A1Method of adjusting a lithographic toolFiled 2001·Application pending·0 cites
- 1933US2004117055A1Configuration and method for detecting defects on a substrate in a processing toolFiled 2003·Application pending·0 cites
- 2031US2005106476A1Method for producing a mask adapted to an exposure apparatusFiled 2004·Application pending·0 cites
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