Inventor · disambiguated record
Yoshifumi Ogawa
Also filed as: OGAWA YOSHIFUMI
31 granted patents·1 pending application·902 citations·filing 1984–2021
98Inventor score
Top patents by PatentIndex Score
32 records- 0194US4559100AMicrowave plasma etching apparatusHITACHI LTD·Filed 1984·Granted Dec 17, 1985·43 cites·8 claims
- 0293US5821622ALiquid crystal display deviceTOSHIBA KK·Filed 1996·Granted Oct 13, 1998·132 cites·12 claims
- 0393US4609426AMethod and apparatus for monitoring etchingHITACHI LTD·Filed 1985·Granted Sep 2, 1986·63 cites·11 claims
- 0492US12449825B2Gas supply control deviceHITACHI HIGH TECH CORP·Filed 2021·Granted Oct 21, 2025·2 cites·11 claims
- 0590US6048434ASubstrate holding system including an electrostatic chuckHITACHI LTD·Filed 1996·Granted Apr 11, 2000·68 cites·15 claims
- 0690US5685684AVacuum processing systemHITACHI LTD·Filed 1996·Granted Nov 11, 1997·112 cites·4 claims
- 0789US10121686B2Vacuum processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 6, 2018·7 cites·8 claims
- 0888US5906684AMethod of holding substrate and substrate holding systemHITACHI LTD·Filed 1998·Granted May 25, 1999·54 cites·21 claims
- 0987US6524428B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2001·Granted Feb 25, 2003·24 cites·11 claims
- 1087US5792304AMethod of holding substrate and substrate holding systemHITACHI LTD·Filed 1994·Granted Aug 11, 1998·62 cites·14 claims
- 1185US5646489APlasma generator with mode restricting meansHITACHI LTD·Filed 1995·Granted Jul 8, 1997·43 cites·46 claims
- 1284US9273394B2Plasma processing apparatus and diagnosis method thereofNAGATANI MASAHIRO·Filed 2012·Granted Mar 1, 2016·3 cites·5 claims
- 1384US6645871B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2001·Granted Nov 11, 2003·20 cites·5 claims
- 1478US5296653ADevice having a multi-layered conductor structureTOSHIBA KK·Filed 1992·Granted Mar 22, 1994·54 cites·19 claims
- 1577US6899789B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2003·Granted May 31, 2005·11 cites·5 claims
- 1674US6676805B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2002·Granted Jan 13, 2004·10 cites·12 claims
- 1774US5433789AMethods and apparatus for generating plasma, and semiconductor processing methods using mode restricted microwavesHITACHI LTD·Filed 1993·Granted Jul 18, 1995·22 cites·27 claims
- 1872US6544379B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2001·Granted Apr 8, 2003·9 cites·50 claims
- 1972US5738948AElectrode-wiring material and electrode-wiring substrate using the sameTOSHIBA KK·Filed 1995·Granted Apr 14, 1998·33 cites·48 claims
- 2070US6610170B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2002·Granted Aug 26, 2003·8 cites·2 claims
- 2170US5961774AMethod of holding substrate and substrate holding systemHITACHI LTD·Filed 1997·Granted Oct 5, 1999·22 cites·6 claims
- 2268US9245780B2Vacuum processing apparatus and operating method of the sameSHIMOMURA TAKAHIRO·Filed 2012·Granted Jan 26, 2016·3 cites·2 claims
- 2368US6336991B1Method of holding substrate and substrate holding systemHITACHI LTD·Filed 1998·Granted Jan 8, 2002·19 cites·10 claims
- 2466USD924824SIon shield plate base for semiconductor manufacturing apparatusHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 13, 2021·10 cites·1 claims
- 2566US6610171B2Method of holding substrate and substrate holding systemHITACHI LTD·Filed 2002·Granted Aug 26, 2003·6 cites·2 claims
- 2666US6221201B1Method of holding substrate and substrate holding systemHITACHI LTD·Filed 1998·Granted Apr 24, 2001·18 cites·2 claims
- 2765US5985035AMethod of holding substrate and substrate holding systemHITACHI LTD·Filed 1998·Granted Nov 16, 1999·17 cites·1 claims
- 2857US5212094AAutomatic chemical analyzerTOSHIBA KK·Filed 1991·Granted May 18, 1993·19 cites·2 claims
- 2950US12442455B2Gas supply apparatus, vacuum processing apparatus, and gas supply methodHITACHI HIGH TECH CORP·Filed 2021·Granted Oct 14, 2025·0 cites·8 claims
- 3045US11835465B2Detecting method and detecting device of gas components and processing apparatus using detecting device of gas componentsHITACHI HIGH TECH CORP·Filed 2019·Granted Dec 5, 2023·0 cites·5 claims
- 3140US4664767APlasma treating method and apparatus thereforHITACHI LTD·Filed 1985·Granted May 12, 1987·8 cites·14 claims
- 3234US2019085544A1Facility deviceLIXIL CORP·Filed 2018·Application pending·0 cites
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