Inventor · disambiguated record
Yoshihiro Arimoto
Also filed as: ARIMOTO YOSHIHIRO
16 granted patents·764 citations·filing 1987–2005
95Inventor score
Top patents by PatentIndex Score
16 records- 0197US5624300AApparatus and method for uniformly polishing a waferFUJITSU LTD·Filed 1996·Granted Apr 29, 1997·231 cites·8 claims
- 0295US5562529AApparatus and method for uniformly polishing a waferFUJITSU LTD·Filed 1993·Granted Oct 8, 1996·119 cites·6 claims
- 0388US5904609APolishing apparatus and polishing methodFUJITSU LTD·Filed 1996·Granted May 18, 1999·91 cites·25 claims
- 0486US7465980B2Ferroelectric memory, multivalent data recording method and multivalent data reading methodFUJITSU LTD·Filed 2005·Granted Dec 16, 2008·16 cites·11 claims
- 0582US5413951AComposite semiconductor substrate and a fabrication process thereofFUJITSU LTD·Filed 1993·Granted May 9, 1995·73 cites·19 claims
- 0680US5037774AProcess for the production of semiconductor devices utilizing multi-step deposition and recrystallization of amorphous siliconFUJITSU LTD·Filed 1987·Granted Aug 6, 1991·55 cites·15 claims
- 0773US5621239ASOI device having a buried layer of reduced resistivityFUJITSU LTD·Filed 1995·Granted Apr 15, 1997·49 cites·31 claims
- 0867US5760343ACombinational weighing systems and methods for automatically aligning weighed article batchesISHIDA SEISAKUSHO·Filed 1997·Granted Jun 2, 1998·27 cites·21 claims
- 0964US6686048B1Composite carbonaceous heat insulatorKUREHA CHEMICAL IND CO LTD·Filed 2000·Granted Feb 3, 2004·9 cites·9 claims
- 1059US5399233AMethod of and apparatus for manufacturing a semiconductor substrateFUJITSU LTD·Filed 1992·Granted Mar 21, 1995·35 cites·9 claims
- 1150US5763325AFabrication process of a semiconductor device using a slurry containing manganese oxideFUJITSU LTD·Filed 1996·Granted Jun 9, 1998·13 cites·12 claims
- 1250US5506433AComposite semiconductor substrate having a single crystal substrate and a single crystal layer formed thereonFUJITSU LTD·Filed 1994·Granted Apr 9, 1996·17 cites·16 claims
- 1344US7674634B2Method of producing semiconductor deviceFUJITSU LTD·Filed 2003·Granted Mar 9, 2010·2 cites·11 claims
- 1444US6114247APolishing cloth for use in a CMP process and a surface treatment thereofFUJITSU LTD·Filed 1997·Granted Sep 5, 2000·11 cites·9 claims
- 1544US5877089ASlurry containing manganese oxideFUJITSU LTD·Filed 1998·Granted Mar 2, 1999·9 cites·5 claims
- 1638US6159858ASlurry containing manganese oxide and a fabrication process of a semiconductor device using such a slurryFUJITSU LTD·Filed 1997·Granted Dec 12, 2000·7 cites·25 claims
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