Inventor · disambiguated record
Yukihisa Yoshida
Also filed as: YOSHIDA YUKIHISA
17 granted patents·5 pending applications·155 citations·filing 1994–2016
93Inventor score
Top patents by PatentIndex Score
22 records- 0186US7786541B2Semiconductor pressure sensor and its fabrication methodMITSUBISHI ELECTRIC CORP·Filed 2006·Granted Aug 31, 2010·13 cites·7 claims
- 0284US7894205B2Variable device circuit and method for manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 2008·Granted Feb 22, 2011·12 cites·20 claims
- 0382US6528724B1Microdevice and its production methodMITSUBISHI ELECTRIC CORP·Filed 2000·Granted Mar 4, 2003·30 cites·5 claims
- 0473US6736008B2Inertia force sensorMITSUBISHI ELECTRIC CORP·Filed 2002·Granted May 18, 2004·17 cites·5 claims
- 0571US7495529B2Phase shift circuit, high frequency switch, and phase shifterMITSUBISHI ELECTRIC CORP·Filed 2004·Granted Feb 24, 2009·16 cites·12 claims
- 0671US7285841B2Method of manufacturing signal processing apparatusMITSUBISHI ELECTRIC CORP·Filed 2006·Granted Oct 23, 2007·5 cites·4 claims
- 0770US7030721B2High frequency apparatus for transmitting or processing high frequency signalMITSUBISHI ELECTRIC CORP·Filed 2003·Granted Apr 18, 2006·11 cites·14 claims
- 0867US6759591B2Silicon deviceMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Jul 6, 2004·14 cites·7 claims
- 0962US10181639B2Antenna deviceMITSUBISHI ELECTRIC CORP·Filed 2015·Granted Jan 15, 2019·2 cites·14 claims
- 1061US7541894B2Phase-shifting circuit and multibit phase shifterMITSUBISHI ELECTRIC CORP·Filed 2004·Granted Jun 2, 2009·9 cites·21 claims
- 1159US9212049B2SOI wafer, manufacturing method therefor, and MEMS deviceYOSHIKAWA EIJI·Filed 2013·Granted Dec 15, 2015·1 cites·12 claims
- 1258US7081370B2Silicon substrate apparatus and method of manufacturing the silicon substrate apparatusMITSUBISHI ELECTRIC CORP·Filed 2002·Granted Jul 25, 2006·6 cites·15 claims
- 1351US9266715B2SOI wafer, manufacturing method therefor, and MEMS deviceYOSHIKAWA EIJI·Filed 2014·Granted Feb 23, 2016·0 cites·8 claims
- 1449US5679625AMethod of making an oxide superconducting thin filmNIPPON STEEL CORP·Filed 1995·Granted Oct 21, 1997·15 cites·7 claims
- 1546US2012168082A1Plasma generating apparatusIZUO SHINICHI·Filed 2010·Application pending·0 cites
- 1646US2009250160A1Method of fabricating optical functional elementMITSUBISHI ELECTRIC CORP·Filed 2009·Application pending·0 cites
- 1745US2007290517A1Non-Contact Transport ApparatusSMC KK·Filed 2007·Application pending·0 cites
- 1842US10347553B2Ceramic substrate and method for manufacturing the sameMITSUBISHI ELECTRIC CORP·Filed 2016·Granted Jul 9, 2019·0 cites·15 claims
- 1939US10852529B2Mirror driving apparatus and method for manufacturing thereofMITSUBISHI ELECTRIC CORP·Filed 2016·Granted Dec 1, 2020·0 cites·5 claims
- 2037US2013309416A1Atmospheric pressure plasma treatment apparatus and atmospheric pressure plasma treatment methodYOKOYAMA YOSHINORI·Filed 2011·Application pending·0 cites
- 2134US5466665AMethod of manufacturing Y-Ba-Cu-O superconducting thin filmMITSUBISHI ELECTRIC CORP·Filed 1994·Granted Nov 14, 1995·4 cites·11 claims
- 2234US2009027138A1Switch CircuitNISHINO TAMOTSU·Filed 2005·Application pending·0 cites
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