Inventor · disambiguated record
Geert Vandenberghe
Also filed as: VANDENBERGHE GEERT
1 granted patent·1 pending application·11 citations·filing 2004–2008
35Inventor score
Technology areasG03F
Files withASML NETHERLANDS BV2
Top patents by PatentIndex Score
2 records- 0171US7466413B2Marker structure, mask pattern, alignment method and lithographic method and apparatusASML NETHERLANDS BV·Filed 2004·Granted Dec 16, 2008·11 cites·3 claims
- 0251US2009073406A1Marker structure, mask pattern, alignment method, and lithographic method and apparatusASML NETHERLANDS BV·Filed 2008·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →