Inventor · disambiguated record
Frank L. Pasquale
Also filed as: PASQUALE FRANK · PASQUALE FRANK L · PASQUALE FRANK LOREN
45 granted patents·12 pending applications·927 citations·filing 1989–2025
98Inventor score
Top patents by PatentIndex Score
57 records- 0199US9390909B2Soft landing nanolaminates for advanced patterningNOVELLUS SYSTEMS INC·Filed 2014·Granted Jul 12, 2016·500 cites·18 claims
- 0298US10043657B2Plasma assisted atomic layer deposition metal oxide for patterning applicationsLAM RES CORP·Filed 2017·Granted Aug 7, 2018·23 cites·19 claims
- 0398US9892917B2Plasma assisted atomic layer deposition of multi-layer films for patterning applicationsLAM RES CORP·Filed 2016·Granted Feb 13, 2018·55 cites·18 claims
- 0498US9673041B2Plasma assisted atomic layer deposition titanium oxide for patterning applicationsLAM RES CORP·Filed 2016·Granted Jun 6, 2017·26 cites·20 claims
- 0598US9570290B2Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applicationsLAM RES CORP·Filed 2016·Granted Feb 14, 2017·29 cites·19 claims
- 0698US9508547B1Composition-matched curtain gas mixtures for edge uniformity modulation in large-volume ALD reactorsLAM RES CORP·Filed 2015·Granted Nov 29, 2016·31 cites·20 claims
- 0798US9373500B2Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applicationsLAM RES CORP·Filed 2014·Granted Jun 21, 2016·41 cites·22 claims
- 0897US10679848B2Selective atomic layer deposition with post-dose treatmentLAM RES CORP·Filed 2018·Granted Jun 9, 2020·10 cites·13 claims
- 0996US10665429B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2017·Granted May 26, 2020·6 cites·20 claims
- 1096US10062563B2Selective atomic layer deposition with post-dose treatmentLAM RES CORP·Filed 2016·Granted Aug 28, 2018·16 cites·18 claims
- 1196US9793096B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2015·Granted Oct 17, 2017·16 cites·18 claims
- 1296US9698042B1Wafer centering in pocket to improve azimuthal thickness uniformity at wafer edgeLAM RES CORP·Filed 2016·Granted Jul 4, 2017·23 cites·19 claims
- 1395US10378107B2Low volume showerhead with faceplate holes for improved flow uniformityLAM RES CORP·Filed 2015·Granted Aug 13, 2019·11 cites·26 claims
- 1494US11072860B2Fill on demand ampoule refillLAM RES CORP·Filed 2015·Granted Jul 27, 2021·6 cites·14 claims
- 1592US5018291ADisplay holderTRANS WORLD MARKETING CORP·Filed 1989·Granted May 28, 1991·81 cites·4 claims
- 1691US10407773B2Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD systemLAM RES CORP·Filed 2017·Granted Sep 10, 2019·6 cites·17 claims
- 1791US9905423B2Soft landing nanolaminates for advanced patterningNOVELLUS SYSTEMS INC·Filed 2016·Granted Feb 27, 2018·5 cites·14 claims
- 1891US9617638B2Methods and apparatuses for showerhead backside parasitic plasma suppression in a secondary purge enabled ALD systemLAM RES CORP·Filed 2014·Granted Apr 11, 2017·9 cites·24 claims
- 1990US10741365B2Low volume showerhead with porous baffleLAM RES CORP·Filed 2015·Granted Aug 11, 2020·7 cites·20 claims
- 2089US11959175B2Fill on demand ampoule refillLAM RES CORP·Filed 2021·Granted Apr 16, 2024·1 cites·19 claims
- 2187US9631276B2Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer depositionLAM RES CORP·Filed 2015·Granted Apr 25, 2017·2 cites·13 claims
- 2286US10049869B2Composite dielectric interface layers for interconnect structuresLAM RES CORP·Filed 2016·Granted Aug 14, 2018·4 cites·11 claims
- 2385US2024218515A1Fill on demand ampoule refillLAM RES CORP·Filed 2024·Application pending·0 cites
- 2484US10418236B2Composite dielectric interface layers for interconnect structuresLAM RES CORP·Filed 2018·Granted Sep 17, 2019·3 cites·20 claims
- 2581US10100407B2Hardware and process for film uniformity improvementLAM RES CORP·Filed 2014·Granted Oct 16, 2018·1 cites·29 claims
- 2681US9624578B2Method for RF compensation in plasma assisted atomic layer depositionLAM RES CORP·Filed 2014·Granted Apr 18, 2017·2 cites·13 claims
- 2781US2024395513A1Apparatus for cleaning plasma chambersLAM RES CORP·Filed 2024·Application pending·0 cites
- 2879US10622243B2Planar substrate edge contact with open volume equalization pathways and side containmentLAM RES CORP·Filed 2017·Granted Apr 14, 2020·2 cites·19 claims
- 2979US9920844B2Valve manifold deadleg elimination via reentrant flow pathLAM RES CORP·Filed 2015·Granted Mar 20, 2018·3 cites·34 claims
- 3077US10192742B2Soft landing nanolaminates for advanced patterningNOVELLUS SYSTEMS INC·Filed 2018·Granted Jan 29, 2019·1 cites·20 claims
- 3177US10049911B2Temporally pulsed and kinetically modulated CVD dielectrics for gapfill applicationsLAM RES CORP·Filed 2016·Granted Aug 14, 2018·2 cites·20 claims
- 3276US11661654B2Substrate processing systems including gas delivery system with reduced dead legsLAM RES CORP·Filed 2018·Granted May 30, 2023·2 cites·10 claims
- 3376US9460915B2Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edgesLAM RES CORP·Filed 2014·Granted Oct 4, 2016·3 cites·8 claims
- 3475US2025257453A1Throughput improvement with interval conditioning purgingLAM RES CORP·Filed 2025·Application pending·0 cites
- 3572US10526700B2Hardware and process for film uniformity improvementLAM RES CORP·Filed 2018·Granted Jan 7, 2020·0 cites·28 claims
- 3672US2025197995A1Plasma-enhanced atomic layer deposition with radio-frequency power rampingLAM RES CORP·Filed 2025·Application pending·0 cites
- 3769US11959172B2Substrate processing systems including gas delivery system with reduced dead legsLAM RES CORP·Filed 2023·Granted Apr 16, 2024·0 cites·10 claims
- 3869US11127567B2Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformityLAM RES CORP·Filed 2020·Granted Sep 21, 2021·0 cites·24 claims
- 3965US12057300B2Apparatus for cleaning plasma chambersLAM RES CORP·Filed 2020·Granted Aug 6, 2024·0 cites·25 claims
- 4063US11443975B2Planar substrate edge contact with open volume equalization pathways and side containmentLAM RES CORP·Filed 2020·Granted Sep 13, 2022·0 cites·24 claims
- 4162US12291777B2Throughput improvement with interval conditioning purgingLAM RES CORP·Filed 2019·Granted May 6, 2025·0 cites·19 claims
- 4262US12270103B2Plasma-enhanced atomic layer deposition with radio-frequency power rampingLAM RES CORP·Filed 2020·Granted Apr 8, 2025·0 cites·18 claims
- 4355US10323323B2Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer depositionLAM RES CORP·Filed 2017·Granted Jun 18, 2019·0 cites·13 claims
- 4455US2014030444A1High pressure, high power plasma activated conformal film depositionNOVELLUS SYSTEMS INC·Filed 2013·Application pending·0 cites
- 4552US2025054747A1Conformal deposition of silicon nitrideLAM RES CORP·Filed 2022·Application pending·0 cites
- 4651US12252782B2In-situ PECVD cap layerLAM RES CORP·Filed 2020·Granted Mar 18, 2025·0 cites·18 claims
- 4751US2025087481A1Increasing deposition rates of oxide filmsLAM RES CORP·Filed 2022·Application pending·0 cites
- 4851US2024167153A1In-situ film annealing in substrate processingLAM RES CORP·Filed 2022·Application pending·0 cites
- 4950US9852901B2Systems and methods for reducing backside deposition and mitigating thickness changes at substrate edgesLAM RES CORP·Filed 2016·Granted Dec 26, 2017·0 cites·7 claims
- 5050US2016052651A1Fill on demand ampouleLAM RES CORP·Filed 2014·Application pending·0 cites
Showing the top 50 of 57 patent records by PatentIndex Score.
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