Inventor · disambiguated record
Brian E. Bottema
Also filed as: BOTTEMA BRIAN · BOTTEMA BRIAN E
9 granted patents·103 citations·filing 2003–2008
87Inventor score
Technology areasB24B
Files withFREESCALE SEMICONDUCTOR INC9
Top patents by PatentIndex Score
9 records- 0192US7179151B1Polishing pad, a polishing apparatus, and a process for using the polishing padFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Feb 20, 2007·25 cites·20 claims
- 0285US7534162B2Grooved platen with channels or pathway to ambient airFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted May 19, 2009·13 cites·13 claims
- 0384US6887138B2Chemical mechanical polish (CMP) conditioning-disk holderFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted May 3, 2005·30 cites·22 claims
- 0483US7074118B1Polishing carrier head with a modified pressure profileFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Jul 11, 2006·12 cites·20 claims
- 0572US7520797B2Platen endpoint window with pressure reliefFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Apr 21, 2009·5 cites·20 claims
- 0666US7497763B2Polishing pad, a polishing apparatus, and a process for using the polishing padFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Mar 3, 2009·3 cites·20 claims
- 0763US6905392B2Polishing system having a carrier head with substrate presence sensingFREESCALE SEMICONDUCTOR INC·Filed 2003·Granted Jun 14, 2005·14 cites·21 claims
- 0857US7892070B2Process of using a polishing apparatus including a platen window and a polishing padFREESCALE SEMICONDUCTOR INC·Filed 2008·Granted Feb 22, 2011·1 cites·18 claims
- 0946US7985122B2Method of polishing a layer using a polishing padFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted Jul 26, 2011·0 cites·18 claims
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