Inventor · disambiguated record
David Shidner
Also filed as: SHIDNER DAVID · SHIDNER DAVID L
7 granted patents·1 pending application·491 citations·filing 1999–2017
89Inventor score
Top patents by PatentIndex Score
8 records- 0197US6749485B1Hydrolytically stable grooved polishing pads for chemical mechanical planarizationRODEL INC·Filed 2000·Granted Jun 15, 2004·98 cites·31 claims
- 0297US6736709B1Grooved polishing pads for chemical mechanical planarizationRODEL INC·Filed 2000·Granted May 18, 2004·96 cites·28 claims
- 0397US6582283B2Polishing pads for chemical mechanical planarizationRODEL INC·Filed 2002·Granted Jun 24, 2003·71 cites·10 claims
- 0497US6454634B1Polishing pads for chemical mechanical planarizationRODEL INC·Filed 2000·Granted Sep 24, 2002·123 cites·48 claims
- 0595US6860802B1Polishing pads for chemical mechanical planarizationROHM AND HAAS ELECTRIC MATERIA·Filed 2000·Granted Mar 1, 2005·81 cites·22 claims
- 0655US6361409B1Polymeric polishing pad having improved surface layer and method of making sameRODEL INC·Filed 1999·Granted Mar 26, 2002·22 cites·25 claims
- 0745US11524390B2Methods of making chemical mechanical polishing layers having improved uniformityROHM & HAAS ELECT MATERIALS CMP HOLDINGS INC·Filed 2017·Granted Dec 13, 2022·0 cites·6 claims
- 0841US2005020082A1Polishing pads for chemical mechanical planarizationFiled 2004·Application pending·0 cites
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