Inventor · disambiguated record
Masaharu Nishiumi
Also filed as: NISHIUMI MASAHARU
7 granted patents·325 citations·filing 1985–2001
89Inventor score
Files withHITACHI LTD7
Top patents by PatentIndex Score
7 records- 0193US4609426AMethod and apparatus for monitoring etchingHITACHI LTD·Filed 1985·Granted Sep 2, 1986·63 cites·11 claims
- 0291US5432315APlasma process apparatus including ground electrode with protection filmHITACHI LTD·Filed 1994·Granted Jul 11, 1995·68 cites·17 claims
- 0385US5110408AProcess for etchingHITACHI LTD·Filed 1991·Granted May 5, 1992·95 cites·27 claims
- 0471US5290993AMicrowave plasma processing deviceHITACHI LTD·Filed 1992·Granted Mar 1, 1994·42 cites·27 claims
- 0569US4618398ADry etching methodHITACHI LTD·Filed 1985·Granted Oct 21, 1986·36 cites·2 claims
- 0666US6754552B2Control apparatus for plasma utilizing equipmentHITACHI LTD·Filed 2001·Granted Jun 22, 2004·11 cites·13 claims
- 0752US6046425APlasma processing apparatus having insulator disposed on inner surface of plasma generating chamberHITACHI LTD·Filed 1995·Granted Apr 4, 2000·10 cites·21 claims
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →