Inventor · disambiguated record
Kenneth Lucchesi
Also filed as: LUCCHESI KENNETH
12 granted patents·4 pending applications·280 citations·filing 2015–2022
92Inventor score
Files withLAM RES CORP16
Top patents by PatentIndex Score
16 records- 0198US10115568B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2017·Granted Oct 30, 2018·57 cites·26 claims
- 0298US9852889B1Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2016·Granted Dec 26, 2017·135 cites·21 claims
- 0397US9761414B2Uniformity control circuit for use within an impedance matching circuitLAM RES CORP·Filed 2015·Granted Sep 12, 2017·38 cites·23 claims
- 0496US10283330B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2017·Granted May 7, 2019·14 cites·19 claims
- 0595US10615003B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2018·Granted Apr 7, 2020·9 cites·20 claims
- 0693US11195706B2Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generatorsLAM RES CORP·Filed 2019·Granted Dec 7, 2021·7 cites·21 claims
- 0792US10002746B1Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2017·Granted Jun 19, 2018·8 cites·26 claims
- 0891US10825656B2Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ringLAM RES CORP·Filed 2020·Granted Nov 3, 2020·2 cites·20 claims
- 0990US10304662B2Multi regime plasma wafer processing to increase directionality of ionsLAM RES CORP·Filed 2018·Granted May 28, 2019·5 cites·26 claims
- 1084US10115564B2Uniformity control circuit for use within an impedance matching circuitLAM RES CORP·Filed 2017·Granted Oct 30, 2018·3 cites·18 claims
- 1177US10916409B2Active control of radial etch uniformityLAM RES CORP·Filed 2018·Granted Feb 9, 2021·2 cites·29 claims
- 1256US2025006470A1Edge capacitively coupled plasma chamber structureLAM RES CORP·Filed 2022·Application pending·0 cites
- 1354US2025239434A1Plasma systems and methods for using square-shaped pulse signalsLAM RES CORP·Filed 2022·Application pending·0 cites
- 1453US11935730B2Systems and methods for cleaning an edge ring pocketLAM RES CORP·Filed 2020·Granted Mar 19, 2024·0 cites·20 claims
- 1553US2024404789A1Systems and methods for determining a phase difference between rf signals provided to electrodesLAM RES CORP·Filed 2022·Application pending·0 cites
- 1648US2023059495A1Optimization of Radiofrequency Signal Ground Return in Plasma Processing SystemLAM RES CORP·Filed 2021·Application pending·0 cites
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