Inventor · disambiguated record
Chun-Geun Park
Also filed as: PARK CHUN GEUN
16 granted patents·1 pending application·309 citations·filing 1994–2009
94Inventor score
Top patents by PatentIndex Score
17 records- 0188US5851727APhotosensitive polymers and photoresist compositions containing the sameSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Dec 22, 1998·35 cites·24 claims
- 0284US5418186AMethod for manufacturing a bump on a semiconductor chipSAMSUNG ELECTRONICS CO LTD·Filed 1994·Granted May 23, 1995·95 cites·14 claims
- 0381US5759755ASemiconductor substrate containing anti-reflective layerSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Jun 2, 1998·54 cites·10 claims
- 0467US6300036B1Photosensitive polymers and chemically amplified photoresist compositions using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Oct 9, 2001·13 cites·13 claims
- 0562US6280903B1Chemically amplified resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Aug 28, 2001·5 cites·8 claims
- 0660US5496770AMethod for manufacturing a semiconductor chip bump having improved contact characteristicsSAMSUNG ELECTRONICS CO LTD·Filed 1994·Granted Mar 5, 1996·28 cites·10 claims
- 0758US5733704AResist compositions for chemically amplified resists comprising a di(t-butyl)malonyl methyl side group in the base polymerSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Mar 31, 1998·17 cites·8 claims
- 0857US6103845AChemically amplified resist polymersSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Aug 15, 2000·11 cites·8 claims
- 0952US5847063AResins for use in chemically amplified resists and manufacturing methods thereofSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Dec 8, 1998·8 cites·3 claims
- 1051US5981141AChemically amplified resistsSAMSUNG ELECTRONICS CO LTD·Filed 1997·Granted Nov 9, 1999·13 cites·33 claims
- 1149US6171754B1Chemically amplified resist compositionsSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Jan 9, 2001·5 cites·5 claims
- 1248US5593725AAnti-reflective layer and method for manufacturing semiconductor device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 1994·Granted Jan 14, 1997·15 cites·21 claims
- 1343US2010151389A1Alkaline developable photosensitive materialsROHM & HAAS ELECT MAT·Filed 2009·Application pending·0 cites
- 1442US6114084AChemically amplified resist compositionSAMSUNG ELECTRONICS CO LTD·Filed 1998·Granted Sep 5, 2000·6 cites·6 claims
- 1537US6416927B1Chemically amplified resist compositionsSAMSUNG ELECTRONICS CO LTD·Filed 2000·Granted Jul 9, 2002·1 cites·3 claims
- 1636US6713229B2Terpolymer for amplified resistSAMSUNG ELECTRONICS CO LTD·Filed 2002·Granted Mar 30, 2004·1 cites·41 claims
- 1735US5856411AResins for use in chemically amplified resists and manufacturing methods thereofSAMSUNG ELECTRONICS CO LTD·Filed 1996·Granted Jan 5, 1999·2 cites·7 claims
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