Inventor · disambiguated record

Hongkong Wang

Also filed as: WANG HONGKONG

1 granted patent·0 citations·filing 2018–2018

9Inventor score

Technology areasH01J

Files withUNIV TAIYUAN TECHNOLOGY1

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1 record

0139US11270869B2Plasma chemical vapor deposition reactor with a microwave resonant cavityUNIV TAIYUAN TECHNOLOGY·Filed 2018·Granted Mar 8, 2022·0 cites·5 claims

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