Inventor · disambiguated record
Dean J. Larson
Also filed as: LARSON DEAN · LARSON DEAN J · LARSON DEAN JAY
24 granted patents·2 pending applications·360 citations·filing 1999–2020
96Inventor score
Top patents by PatentIndex Score
26 records- 0195US8313611B2Gas switching section including valves having different flow coefficients for gas distribution systemLARSON DEAN J·Filed 2011·Granted Nov 20, 2012·20 cites·6 claims
- 0295US7939778B2Plasma processing chamber with guard ring for upper electrode assemblyLAM RES CORP·Filed 2009·Granted May 10, 2011·27 cites·20 claims
- 0394US8088248B2Gas switching section including valves having different flow coefficients for gas distribution systemLARSON DEAN J·Filed 2006·Granted Jan 3, 2012·30 cites·10 claims
- 0493US7482550B2Quartz guard ringLAM RES CORP·Filed 2007·Granted Jan 27, 2009·18 cites·19 claims
- 0591US10651015B2Variable depth edge ring for etch uniformity controlLAM RES CORP·Filed 2017·Granted May 12, 2020·7 cites·10 claims
- 0691US7875824B2Quartz guard ring centering featuresLAM RES CORP·Filed 2007·Granted Jan 25, 2011·16 cites·21 claims
- 0791US7169231B2Gas distribution system with tuning gasLAM RES CORP·Filed 2002·Granted Jan 30, 2007·47 cites·13 claims
- 0890US8701268B2Composite showerhead electrode assembly for a plasma processing apparatusLAM RES CORP·Filed 2013·Granted Apr 22, 2014·10 cites·21 claims
- 0989US8449786B2Film adhesive for semiconductor vacuum processing apparatusLARSON DEAN J·Filed 2008·Granted May 28, 2013·15 cites·16 claims
- 1088US6481723B1Lift pin impact managementLAM RES CORP·Filed 2001·Granted Nov 19, 2002·42 cites·21 claims
- 1186US7371332B2Uniform etch systemLAM RES CORP·Filed 2003·Granted May 13, 2008·29 cites·11 claims
- 1285US9234775B2Methods for verifying gas flow rates from a gas supply system into a plasma processing chamberLAM RES CORP·Filed 2013·Granted Jan 12, 2016·6 cites·25 claims
- 1385US8084705B2Quartz guard ring centering featuresLARSON DEAN J·Filed 2010·Granted Dec 27, 2011·6 cites·12 claims
- 1484US8772171B2Gas switching section including valves having different flow coefficients for gas distribution systemLAM RES CORP·Filed 2012·Granted Jul 8, 2014·5 cites·15 claims
- 1577US8418649B2Composite showerhead electrode assembly for a plasma processing apparatusLARSON DEAN JAY·Filed 2008·Granted Apr 16, 2013·7 cites·12 claims
- 1672US6364762B1Wafer atmospheric transport module having a controlled mini-environmentLAM RES CORP·Filed 1999·Granted Apr 2, 2002·43 cites·32 claims
- 1769US9859145B2Cooled pin lifter paddle for semiconductor substrate processing apparatusLAM RES CORP·Filed 2013·Granted Jan 2, 2018·2 cites·28 claims
- 1867US11342163B2Variable depth edge ring for etch uniformity controlLAM RES CORP·Filed 2020·Granted May 24, 2022·0 cites·10 claims
- 1967US9484243B2Processing chamber with features from side wallLAM RES CORP·Filed 2014·Granted Nov 1, 2016·2 cites·16 claims
- 2064US8545639B2Method of cleaning aluminum plasma chamber partsSHIH HONG·Filed 2011·Granted Oct 1, 2013·1 cites·19 claims
- 2163US9151408B2Method of polishing a metal surface of a barrier door of a gate valve used in a semiconductor cluster tool architectureLARSON DEAN J·Filed 2012·Granted Oct 6, 2015·2 cites·20 claims
- 2263US8801892B2Uniform etch systemLARSON DEAN J·Filed 2008·Granted Aug 12, 2014·1 cites·7 claims
- 2360US6263542B1Tolerance resistant and vacuum compliant door hinge with open-assist featureLAM RES CORP·Filed 1999·Granted Jul 24, 2001·24 cites·20 claims
- 2453US9028646B2Film adhesive for semiconductor vacuum processing apparatusLAM RES CORP·Filed 2013·Granted May 12, 2015·0 cites·18 claims
- 2541US2007021935A1Methods for verifying gas flow rates from a gas supply system into a plasma processing chamberLARSON DEAN J·Filed 2005·Application pending·0 cites
- 2638US2004112540A1Uniform etch systemLAM RES CORP·Filed 2003·Application pending·0 cites
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