Inventor · disambiguated record
Chelsea Dubose
Also filed as: DUBOSE CHELSEA
12 granted patents·3 pending applications·30 citations·filing 2018–2024
86Inventor score
Files withTOKYO ELECTRON LTD15
Top patents by PatentIndex Score
15 records- 0196US11600474B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2020·Granted Mar 7, 2023·6 cites·19 claims
- 0294US11094507B2Power generation systems and methods for plasma stability and controlTOKYO ELECTRON LTD·Filed 2019·Granted Aug 17, 2021·13 cites·22 claims
- 0389US11817296B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2020·Granted Nov 14, 2023·2 cites·20 claims
- 0489US11410832B2RF measurement system and methodTOKYO ELECTRON LTD·Filed 2020·Granted Aug 9, 2022·2 cites·22 claims
- 0588US12074390B2Parallel resonance antenna for radial plasma controlTOKYO ELECTRON LTD·Filed 2022·Granted Aug 27, 2024·1 cites·22 claims
- 0683US11050394B2Modules, multi-stage systems, and related methods for radio frequency power amplifiersTOKYO ELECTRON LTD·Filed 2019·Granted Jun 29, 2021·4 cites·24 claims
- 0779US12176183B2RF voltage and current (V-I) sensors and measurement methodsTOKYO ELECTRON LTD·Filed 2023·Granted Dec 24, 2024·0 cites·18 claims
- 0876US2024380114A1Parallel Resonance Antenna for Radial Plasma ControlTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0972US11393663B2Methods and systems for focus ring thickness determinations and feedback controlTOKYO ELECTRON LTD·Filed 2019·Granted Jul 19, 2022·1 cites·24 claims
- 1071US11721524B2Power generation systems and methods for plasma stability and controlTOKYO ELECTRON LTD·Filed 2021·Granted Aug 8, 2023·0 cites·20 claims
- 1168US10510512B2Methods and systems for controlling plasma performanceTOKYO ELECTRON LTD·Filed 2018·Granted Dec 17, 2019·1 cites·20 claims
- 1262US12224164B2Radio frequency (RF) system with embedded RF signal pickupsTOKYO ELECTRON LTD·Filed 2021·Granted Feb 11, 2025·0 cites·22 claims
- 1357US2024258074A1Antenna Plane Magnets for Improved PerformanceTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1457US2025069852A1Method for plasma processingTOKYO ELECTRON LTD·Filed 2023·Application pending·0 cites
- 1547US12272520B2Process control enabled VDC sensor for plasma processTOKYO ELECTRON LTD·Filed 2019·Granted Apr 8, 2025·0 cites·23 claims
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