Inventor · disambiguated record
Mark Leonard O'Neill
Also filed as: O'NEILL MARK · O'NEILL MARK L · O'NEILL MARK LEONARD · ONEILL MARK LEONARD
88 granted patents·27 pending applications·3,574 citations·filing 1996–2025
99Inventor score
Files withAIR PROD & CHEM47VERSUM MAT US LLC43XIAO MANCHAO6VRTIS RAYMOND NICHOLAS4MAYORGA STEVEN GERARD3
Top patents by PatentIndex Score
115 records- 0199US6846515B2Methods for using porogens and/or porogenated precursors to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2002·Granted Jan 25, 2005·667 cites·99 claims
- 0298US8993072B2Halogenated organoaminosilane precursors and methods for depositing films comprising sameAIR PROD & CHEM·Filed 2012·Granted Mar 31, 2015·285 cites·36 claims
- 0398US8771807B2Organoaminosilane precursors and methods for making and using sameXIAO MANCHAO·Filed 2012·Granted Jul 8, 2014·453 cites·10 claims
- 0498US7098149B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2003·Granted Aug 29, 2006·624 cites·31 claims
- 0598US6583048B2Organosilicon precursors for interlayer dielectric films with low dielectric constantsAIR PROD & CHEM·Filed 2001·Granted Jun 24, 2003·761 cites·56 claims
- 0697US9243324B2Methods of forming non-oxygen containing silicon-based filmsAIR PROD & CHEM·Filed 2013·Granted Jan 26, 2016·17 cites·22 claims
- 0797US7332445B2Porous low dielectric constant compositions and methods for making and using sameAIR PROD & CHEM·Filed 2005·Granted Feb 19, 2008·65 cites·55 claims
- 0896US8940648B2Process for producing silicon and oxide films from organoaminosilane precursorsAIR PROD & CHEM·Filed 2013·Granted Jan 27, 2015·28 cites·14 claims
- 0996US8912353B2Organoaminosilane precursors and methods for depositing films comprising sameXIAO MANCHAO·Filed 2011·Granted Dec 16, 2014·22 cites·57 claims
- 1095US10453675B2Organoaminosilane precursors and methods for depositing films comprising sameVERSUM MAT US LLC·Filed 2014·Granted Oct 22, 2019·17 cites·5 claims
- 1195US9337018B2Methods for depositing films with organoaminodisilane precursorsAIR PROD & CHEM·Filed 2013·Granted May 10, 2016·15 cites·45 claims
- 1295US9005719B2Organoaminosilane precursors and methods for making and using sameXIAO MANCHAO·Filed 2014·Granted Apr 14, 2015·12 cites·7 claims
- 1395US8530361B2Process for producing silicon and oxide films from organoaminosilane precursorsXIAO MANCHAO·Filed 2010·Granted Sep 10, 2013·20 cites·19 claims
- 1495US8460753B2Methods for depositing silicon dioxide or silicon oxide films using aminovinylsilanesXIAO MANCHAO·Filed 2010·Granted Jun 11, 2013·24 cites·16 claims
- 1595US6716770B2Low dielectric constant material and method of processing by CVDAIR PROD & CHEM·Filed 2001·Granted Apr 6, 2004·110 cites·56 claims
- 1694US8703624B2Dielectric films comprising silicon and methods for making sameYANG LIU·Filed 2010·Granted Apr 22, 2014·18 cites·10 claims
- 1794US7500397B2Activated chemical process for enhancing material properties of dielectric filmsAIR PROD & CHEM·Filed 2008·Granted Mar 10, 2009·30 cites·46 claims
- 1893US9200167B2Alkoxyaminosilane compounds and applications thereofAIR PROD & CHEM·Filed 2013·Granted Dec 1, 2015·10 cites·16 claims
- 1990US9905415B2Methods for depositing silicon nitride filmsAIR PROD & CHEM·Filed 2014·Granted Feb 27, 2018·10 cites·15 claims
- 2090US9460912B2High temperature atomic layer deposition of silicon oxide thin filmsAIR PROD & CHEM·Filed 2013·Granted Oct 4, 2016·9 cites·13 claims
- 2190US7581549B2Method for removing carbon-containing residues from a substrateAIR PROD & CHEM·Filed 2005·Granted Sep 1, 2009·18 cites·20 claims
- 2290US7404990B2Non-thermal process for forming porous low dielectric constant filmsAIR PROD & CHEM·Filed 2002·Granted Jul 29, 2008·47 cites·33 claims
- 2389US9212420B2Chemical vapor deposition methodLEE ERIC M·Filed 2010·Granted Dec 15, 2015·6 cites·23 claims
- 2489US8399349B2Materials and methods of forming controlled voidVRTIS RAYMOND NICHOLAS·Filed 2007·Granted Mar 19, 2013·13 cites·13 claims
- 2589US2025304804A1Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 2688US10465096B2Metal chemical mechanical planarization (CMP) composition and methods thereforeVERSUM MAT US LLC·Filed 2018·Granted Nov 5, 2019·4 cites·21 claims
- 2788US10242864B2High temperature atomic layer deposition of silicon oxide thin filmsAIR PROD & CHEM·Filed 2016·Granted Mar 26, 2019·4 cites·8 claims
- 2888US7468290B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2003·Granted Dec 23, 2008·33 cites·20 claims
- 2987US10032644B2Barrier chemical mechanical planarization slurries using ceria-coated silica abrasivesAIR PROD & CHEM·Filed 2016·Granted Jul 24, 2018·5 cites·18 claims
- 3087US9978609B2Low dishing copper chemical mechanical planarizationAIR PROD & CHEM·Filed 2016·Granted May 22, 2018·6 cites·12 claims
- 3187US9502234B2Methods to prepare silicon-containing filmsAIR PROD & CHEM·Filed 2014·Granted Nov 22, 2016·6 cites·20 claims
- 3287US7932188B2Mechanical enhancement of dense and porous organosilicate materials by UV exposureAIR PROD & CHEM·Filed 2008·Granted Apr 26, 2011·9 cites·19 claims
- 3386US11139162B2Organoaminosilane precursors and methods for depositing films comprising sameVERSUM MAT US LLC·Filed 2019·Granted Oct 5, 2021·2 cites·15 claims
- 3486US6187248B1Nanoporous polymer films for extreme low and interlayer dielectricsAIR PROD & CHEM·Filed 1998·Granted Feb 13, 2001·80 cites·16 claims
- 3585US7384471B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2003·Granted Jun 10, 2008·28 cites·35 claims
- 3684US7943195B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsAIR PROD & CHEM·Filed 2008·Granted May 17, 2011·8 cites·20 claims
- 3784US2023348736A1Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2023·Application pending·0 cites
- 3883US12230496B2Organoaminosilane precursors and methods for depositing films comprising sameVERSON MAT US LLC·Filed 2021·Granted Feb 18, 2025·1 cites·20 claims
- 3983US8293001B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsVRTIS RAYMOND NICHOLAS·Filed 2011·Granted Oct 23, 2012·6 cites·4 claims
- 4082US10319862B2Barrier materials for display devicesAIR PROD & CHEM·Filed 2013·Granted Jun 11, 2019·6 cites·10 claims
- 4182US9061317B2Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constantsVRTIS RAYMOND NICHOLAS·Filed 2012·Granted Jun 23, 2015·8 cites·20 claims
- 4280US11078417B2Low oxide trench dishing chemical mechanical polishingVERSUM MAT US LLC·Filed 2019·Granted Aug 3, 2021·2 cites·5 claims
- 4380US8951342B2Methods for using porogens for low k porous organosilica glass filmsVRTIS RAYMOND NICHOLAS·Filed 2011·Granted Feb 10, 2015·5 cites·23 claims
- 4480US2025183029A1Organoaminosilane precursors and methods for depositing films comprising sameVERSUM MAT US LLC·Filed 2025·Application pending·0 cites
- 4579US11401441B2Chemical mechanical planarization (CMP) composition and methods therefore for copper and through silica via (TSV) applicationsVERSUM MAT US LLC·Filed 2018·Granted Aug 2, 2022·4 cites·2 claims
- 4678US11725111B2Compositions and processes for depositing carbon-doped silicon-containing filmsVERSUM MAT US LLC·Filed 2021·Granted Aug 15, 2023·0 cites·6 claims
- 4778US7999355B2Aminosilanes for shallow trench isolation filmsAIR PROD & CHEM·Filed 2009·Granted Aug 16, 2011·6 cites·1 claims
- 4877US8329933B2Low-impurity organosilicon product as precursor for CVDMAYORGA STEVEN GERARD·Filed 2011·Granted Dec 11, 2012·2 cites·14 claims
- 4976US10991571B2High temperature atomic layer deposition of silicon oxide thin filmsVERSUM MAT US LLC·Filed 2019·Granted Apr 27, 2021·1 cites·12 claims
- 5074US9613799B2Methods for depositing films with organoaminodisilane precursorsAIR PROD & CHEM·Filed 2016·Granted Apr 4, 2017·1 cites·14 claims
Showing the top 50 of 115 patent records by PatentIndex Score.
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