Inventor · disambiguated record
George Stojakovic
Also filed as: LEE LEGAL REPRESENTATIVE KIM P · STOJAKOVIC GEORGE
13 granted patents·4 pending applications·219 citations·filing 2000–2017
92Inventor score
Top patents by PatentIndex Score
17 records- 0193US6984529B2Fabrication process for a magnetic tunnel junction deviceIBM·Filed 2003·Granted Jan 10, 2006·106 cites·29 claims
- 0288US6815248B2Material combinations for tunnel junction cap layer, tunnel junction hard mask and tunnel junction stack seed layer in MRAM processingINFINEON TECHNOLOGIES AG·Filed 2002·Granted Nov 9, 2004·32 cites·28 claims
- 0384US8398778B2Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameterFANG TONG·Filed 2008·Granted Mar 19, 2013·7 cites·11 claims
- 0484US6184134B1Dry process for cleaning residues/polymers after metal etchINFINEON TECHNOLOGIES CORP·Filed 2000·Granted Feb 6, 2001·33 cites·12 claims
- 0583US7097777B2Magnetic switching deviceIBM·Filed 2005·Granted Aug 29, 2006·9 cites·16 claims
- 0682US8349202B2Methods for controlling bevel edge etching in a plasma chamberLAM RES CORP·Filed 2011·Granted Jan 8, 2013·5 cites·12 claims
- 0778US8083890B2Gas modulation to control edge exclusion in a bevel edge etching plasma chamberFANG TONG·Filed 2008·Granted Dec 27, 2011·6 cites·17 claims
- 0868US10629458B2Control of bevel etch film profile using plasma exclusion zone rings larger than the wafer diameterLAM RES CORP·Filed 2013·Granted Apr 21, 2020·1 cites·1 claims
- 0967US7015049B2Fence-free etching of iridium barrier having a steep taper angleTOSHIBA KK·Filed 2003·Granted Mar 21, 2006·11 cites·9 claims
- 1060US10832923B2Lower plasma-exclusion-zone rings for a bevel etcherLAM RES CORP·Filed 2017·Granted Nov 10, 2020·0 cites·27 claims
- 1160US10811282B2Upper plasma-exclusion-zone rings for a bevel etcherLAM RES CORP·Filed 2017·Granted Oct 20, 2020·0 cites·26 claims
- 1257US6815364B2Tungsten hard maskINFINEON TECHNOLOGIES CORP·Filed 2001·Granted Nov 9, 2004·6 cites·21 claims
- 1352US2009170334A1Copper Discoloration Prevention Following Bevel Etch ProcessFANG TONG·Filed 2008·Application pending·0 cites
- 1450US2014051255A1Copper discoloration prevention following bevel etch processLAM RES CORP·Filed 2013·Application pending·0 cites
- 1549US7316785B2Methods and apparatus for the optimization of etch resistance in a plasma processing systemLAM RES CORP·Filed 2004·Granted Jan 8, 2008·3 cites·25 claims
- 1642US2004084400A1Patterning metal stack layers of magnetic switching device, utilizing a bilayer metal hardmaskFiled 2002·Application pending·0 cites
- 1737US2004203242A1System and method for performing a metal layer RIE processFiled 2003·Application pending·0 cites
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