Inventor · disambiguated record
Edward J. Reardon
Also filed as: REARDON EDWARD J · REARDON EDWARD J JR · REARDON JR EDWARD J
11 granted patents·312 citations·filing 1980–2000
91Inventor score
Top patents by PatentIndex Score
11 records- 0197US4343885APhototropic photosensitive compositions containing fluoran colorformerDYNACHEM CORP·Filed 1980·Granted Aug 10, 1982·148 cites·46 claims
- 0291US4552830ACarbonylic halides as activators for phototropic compositionsDYNACHEM CORP·Filed 1983·Granted Nov 12, 1985·34 cites·63 claims
- 0384US6054252APhotoimageable compositions having improved chemical resistance and stripping abilityMORTON INT INC·Filed 1999·Granted Apr 25, 2000·43 cites·15 claims
- 0482US4943511AHigh sensitivity mid and deep UV resistTHIOKOL MORTON INC·Filed 1989·Granted Jul 24, 1990·34 cites·9 claims
- 0570US6329123B1Photoimageable compositions having improved flexibility and stripping abilityMORTON INT INC·Filed 1999·Granted Dec 11, 2001·18 cites·8 claims
- 0664US6166245APhotoimageable compositions having improved chemical resistance and stripping abilitySHIPLEY CO LLC·Filed 2000·Granted Dec 26, 2000·6 cites·22 claims
- 0756US6045973APhotoimageable compositions having improved chemical resistance and stripping abilityMORTON INT INC·Filed 1998·Granted Apr 4, 2000·11 cites·13 claims
- 0845US5609991APhotoimageable composition having improved alkaline process resistance and tack-free surface for contact imagingMORTON INT INC·Filed 1995·Granted Mar 11, 1997·9 cites·30 claims
- 0938US5698376AMethod of producing a resist pattern by contact imaging a photoimageable composition providing a tack-free surfaceMORTON INT INC·Filed 1996·Granted Dec 16, 1997·4 cites·8 claims
- 1033US4996122AMethod of forming resist pattern and thermally stable and highly resolved resist patternMORTON INT INC·Filed 1990·Granted Feb 26, 1991·3 cites·17 claims
- 1127US6322951B1Photoimageable compositions having improved flexibility and stripping abilityNORTON INTERNATIONAL INC·Filed 1998·Granted Nov 27, 2001·2 cites·11 claims
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