Inventor · disambiguated record
Uwe Dietze
Also filed as: DIETZE UWE
13 granted patents·1 pending application·58 citations·filing 2000–2018
86Inventor score
Files withSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG9STEAG HAMATECH AG2SUSS MIRCROTEC PHOTOMASK EQUIPMENT GMBH & CO KG2DIETZE UWE1
Top patents by PatentIndex Score
14 records- 0183US6512207B1Apparatus and method for the treatment of substratesSTEAG HAMATECH AG·Filed 2000·Granted Jan 28, 2003·40 cites·19 claims
- 0269US6919538B2Method for thermally treating substratesSTEAG HAMATECH AG·Filed 2001·Granted Jul 19, 2005·15 cites·15 claims
- 0368US10265739B2Method and apparatus for treating substratesSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2017·Granted Apr 23, 2019·1 cites·22 claims
- 0461US11090693B2Device for applying to a substrate a liquid medium that has been charged with UV radiationSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2016·Granted Aug 17, 2021·1 cites·15 claims
- 0559US10722925B2Treatment head, treatment system and method for treating a local surface area of a substrateSUSS MIRCROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2017·Granted Jul 28, 2020·1 cites·26 claims
- 0639US9662684B2Method and apparatus for treating substratesDIETZE UWE·Filed 2010·Granted May 30, 2017·0 cites·12 claims
- 0737US10898932B2Method and apparatus for cleaning a substrate and computer program productSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2018·Granted Jan 26, 2021·0 cites·12 claims
- 0835US11410858B2Device for applying to a substrate a liquid medium which is exposed to UV radiationSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2018·Granted Aug 9, 2022·0 cites·9 claims
- 0932US10416575B2Apparatus and method for cleaning a partial area of a substrateSUSS MIRCROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2016·Granted Sep 17, 2019·0 cites·26 claims
- 1031US11358172B2Method for treating substrates with an aqueous liquid medium exposed to UV-radiationSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2015·Granted Jun 14, 2022·0 cites·22 claims
- 1131US11130158B2Device for applying a liquid medium which is exposed to UV radiation to a substrateSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2016·Granted Sep 28, 2021·0 cites·16 claims
- 1230US2017271145A1Method and an apparatus for cleaning substratesSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2016·Application pending·0 cites
- 1328US10845718B2Holder for holding and for protecting a side of a photomask or a photomask or a photomask having pellicle from a cleaning medium, method for cleaning a photomask or a photomask with pellicle and device for opening and closing a holderSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2017·Granted Nov 24, 2020·0 cites·34 claims
- 1426US10843235B2Device for applying a liquid medium which is exposed to UV radiation to a substrateSUSS MICROTEC PHOTOMASK EQUIPMENT GMBH & CO KG·Filed 2016·Granted Nov 24, 2020·0 cites·19 claims
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