Inventor · disambiguated record
Tsutomu Tetsuka
Also filed as: TETSUKA TSUTOMU
28 granted patents·15 pending applications·527 citations·filing 1991–2019
97Inventor score
Top patents by PatentIndex Score
43 records- 0197US6388382B1Plasma processing apparatus and methodHITACHI LTD·Filed 2000·Granted May 14, 2002·78 cites·40 claims
- 0294US6833051B2Plasma processing apparatus and methodHITACHI LTD·Filed 2002·Granted Dec 21, 2004·33 cites·13 claims
- 0394US5128715APrint cartidge and image forming apparatus employing the sameFUJI XEROX CO LTD·Filed 1991·Granted Jul 7, 1992·154 cites·4 claims
- 0492US6756737B2Plasma processing apparatus and methodHITACHI LTD·Filed 2002·Granted Jun 29, 2004·37 cites·4 claims
- 0592US6427621B1Plasma processing device and plasma processing methodHITACHI LTD·Filed 2000·Granted Aug 6, 2002·42 cites·27 claims
- 0692US6180019B1Plasma processing apparatus and methodHITACHI LTD·Filed 1997·Granted Jan 30, 2001·51 cites·2 claims
- 0791US6499424B2Plasma processing apparatus and methodHITACHI LTD·Filed 2001·Granted Dec 31, 2002·23 cites·12 claims
- 0885US7931776B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2006·Granted Apr 26, 2011·8 cites·7 claims
- 0983US6716301B2Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probeHITACHI LTD·Filed 2001·Granted Apr 6, 2004·25 cites·23 claims
- 1082US6846363B2Plasma processing apparatus and methodHITACHI LTD·Filed 2002·Granted Jan 25, 2005·11 cites·6 claims
- 1181US6481370B2Plasma processsing apparatusHITACHI LTD·Filed 2000·Granted Nov 19, 2002·10 cites·9 claims
- 1278US10217613B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Feb 26, 2019·3 cites·10 claims
- 1378US7908104B2Plasma processing apparatus and method for detecting status of said apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Mar 15, 2011·4 cites·12 claims
- 1474US7601241B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2004·Granted Oct 13, 2009·9 cites·11 claims
- 1573US8926790B2Plasma processing apparatusTETSUKA TSUTOMU·Filed 2006·Granted Jan 6, 2015·3 cites·8 claims
- 1673US8282767B2Plasma processing apparatusITABASHI NAOSHI·Filed 2011·Granted Oct 9, 2012·3 cites·2 claims
- 1770US9097754B2Method of manufacturing magnetoresistive elementHITACHI HIGH TECH CORP·Filed 2013·Granted Aug 4, 2015·2 cites·11 claims
- 1868US8006340B2Cleaning apparatusHITACHI HIGH TECH CORP·Filed 2008·Granted Aug 30, 2011·2 cites·9 claims
- 1965US7771607B2Plasma processing apparatus and plasma processing methodHITACHI LTD·Filed 2007·Granted Aug 10, 2010·1 cites·1 claims
- 2062US10796884B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2014·Granted Oct 6, 2020·1 cites·15 claims
- 2161US6899766B2Diagnosis method for semiconductor processing apparatusHITACHI HIGH TECH CORP·Filed 2004·Granted May 31, 2005·6 cites·5 claims
- 2259US8425786B2Plasma etching method and plasma etching apparatusSATAKE MAKOTO·Filed 2010·Granted Apr 23, 2013·1 cites·9 claims
- 2359US6866744B2Semiconductor processing apparatus and a diagnosis method thereforHITACHI HIGH TECH CORP·Filed 2002·Granted Mar 15, 2005·5 cites·3 claims
- 2457US6755935B2Plasma processing apparatusHITACHI LTD·Filed 2001·Granted Jun 29, 2004·5 cites·24 claims
- 2556US2009165951A1Plasma processing apparatus capable of suppressing variation of processing characteristicsITABASHI NAOSHI·Filed 2009·Application pending·0 cites
- 2654US12051560B2Ion gun and ion milling machineHITACHI HIGH TECH CORP·Filed 2019·Granted Jul 30, 2024·0 cites·19 claims
- 2752US2010050938A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2008·Application pending·0 cites
- 2851US5233399ACleaning unit for image forming apparatusFUJI XEROX CO LTD·Filed 1992·Granted Aug 3, 1993·10 cites·7 claims
- 2950US2013000847A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2011·Application pending·0 cites
- 3049US2010282414A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2010·Application pending·0 cites
- 3149US2013200042A1Plasma etching method and plasma etching apparatusSATAKE MAKOTO·Filed 2013·Application pending·0 cites
- 3248US2010258529A1Plasma Processing Apparatus and Plasma Processing MethodMORI MASAHITO·Filed 2009·Application pending·0 cites
- 3346US10229813B2Plasma processing apparatus with lattice-like faraday shieldsHITACHI HIGH TECH CORP·Filed 2014·Granted Mar 12, 2019·0 cites·5 claims
- 3446US8024831B2Cleaning methodHITACHI HIGH TECH CORP·Filed 2010·Granted Sep 27, 2011·0 cites·2 claims
- 3545US2002084035A1Plasma processing apparatus and methodFiled 2002·Application pending·0 cites
- 3644US2005199183A1Plasma processing apparatusFiled 2004·Application pending·0 cites
- 3742US2019287770A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Application pending·0 cites
- 3842US2004149384A1Semiconductor manufacturing apparatus and method of processing semiconductor wafer using plasma, and wafer voltage probeFiled 2003·Application pending·0 cites
- 3941US2008180030A1Plasma processing apparatusTETSUKA TSUTOMU·Filed 2007·Application pending·0 cites
- 4041US2006032584A1Plasma processing apparatus capable of suppressing variation of processing characteristicsITABASHI NAOSHI·Filed 2004·Application pending·0 cites
- 4140US2019189396A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2018·Application pending·0 cites
- 4240US2013299091A1Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 4334US2015270148A1Etching apparatusHITACHI HIGH TECH CORP·Filed 2015·Application pending·0 cites
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