Inventor · disambiguated record
Joong Won Jeon
Also filed as: JEON JOONG-WON
11 granted patents·12 citations·filing 2013–2021
84Inventor score
Files withSAMSUNG ELECTRONICS CO LTD11
Top patents by PatentIndex Score
11 records- 0187US10991692B2Semiconductor device having a plurality of fins and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Apr 27, 2021·2 cites·20 claims
- 0283US8952423B2Semiconductor device having decoupling capacitors and dummy transistorsSAMSUNG ELECTRONICS CO LTD·Filed 2013·Granted Feb 10, 2015·7 cites·15 claims
- 0373US11626396B2Integrated circuit (IC) deviceSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Apr 11, 2023·0 cites·20 claims
- 0470US9557637B2Method of designing patterns of semiconductor devices in consideration of pattern densitySAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jan 31, 2017·2 cites·17 claims
- 0569US11152349B2Integrated circuit (IC) deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 19, 2021·0 cites·19 claims
- 0669US11145640B2Integrated circuit (IC) deviceSAMSUNG ELECTRONICS CO LTD·Filed 2020·Granted Oct 12, 2021·0 cites·20 claims
- 0762US10714467B2Integrated circuit (IC) deviceSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Jul 14, 2020·0 cites·20 claims
- 0860US10643998B2Semiconductor device having first and second fin-type patterns and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted May 5, 2020·0 cites·20 claims
- 0960US9941172B2Method for fabricating semiconductor device including a via hole in a mask patternSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Apr 10, 2018·1 cites·19 claims
- 1055US10475789B2Semiconductor device having first and second fin-type patterns and method of fabricating the sameSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Nov 12, 2019·0 cites·13 claims
- 1141US10409169B2Methods of manufacturing photomasks, methods of inspecting photomasks, and methods of manufacturing semiconductor devicesSAMSUNG ELECTRONICS CO LTD·Filed 2017·Granted Sep 10, 2019·0 cites·15 claims
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