Inventor · disambiguated record
Kazutaka Ishigo
Also filed as: ISHIGO KAZUTAKA
9 granted patents·3 pending applications·21 citations·filing 2006–2016
82Inventor score
Top patents by PatentIndex Score
12 records- 0184US9158212B2Exposure apparatus, exposure control system, and exposure methodISHIGO KAZUTAKA·Filed 2012·Granted Oct 13, 2015·7 cites·20 claims
- 0279US8072601B2Pattern monitor mark and monitoring method suitable for micropatternFUKUHARA KAZUYA·Filed 2008·Granted Dec 6, 2011·7 cites·9 claims
- 0369US8790851B2Mask and method for fabricating semiconductor deviceOKAMOTO YOSUKE·Filed 2012·Granted Jul 29, 2014·2 cites·13 claims
- 0466US7906258B2Photomask, photomask superimposition correcting method, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2008·Granted Mar 15, 2011·2 cites·16 claims
- 0564US8034515B2Pattern forming method, pattern designing method, and mask setTOSHIBA KK·Filed 2009·Granted Oct 11, 2011·2 cites·20 claims
- 0657US8364437B2Mark arrangement inspecting method, mask data, and manufacturing method of semiconductor deviceTOSHIBA KK·Filed 2009·Granted Jan 29, 2013·1 cites·19 claims
- 0746US2009246709A1Manufacturing method of semiconductor deviceNAKASUGI TETSURO·Filed 2009·Application pending·0 cites
- 0842US7973419B2Semiconductor device and method of fabricating the sameTOSHIBA KK·Filed 2006·Granted Jul 5, 2011·0 cites·20 claims
- 0940US2014285787A1Exposure system and exposure methodTOSHIBA KK·Filed 2013·Application pending·0 cites
- 1038US2008248431A1Pattern forming method used in semiconductor device manufacturing and method of manufacturing semiconductor deviceSEINO YURIKO·Filed 2007·Application pending·0 cites
- 1137US9941177B2Pattern accuracy detecting apparatus and processing systemTOSHIBA MEMORY CORP·Filed 2016·Granted Apr 10, 2018·0 cites·13 claims
- 1233US9250542B2Overlay/alignment measurement method and overlay/alignment measurement apparatusISHIGO KAZUTAKA·Filed 2011·Granted Feb 2, 2016·0 cites·15 claims
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