Inventor · disambiguated record
Koji Takeya
Also filed as: TAKEYA KOJI
9 granted patents·4 pending applications·369 citations·filing 1992–2021
86Inventor score
Top patents by PatentIndex Score
13 records- 0197US9991138B2Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2016·Granted Jun 5, 2018·337 cites·6 claims
- 0282US7554095B2Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrateTOKYO ELECTRON LTD·Filed 2007·Granted Jun 30, 2009·7 cites·6 claims
- 0378US7521687B2Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrateTOKYO ELECTRON LTD·Filed 2006·Granted Apr 21, 2009·5 cites·19 claims
- 0474US9607855B2Etching method and storage mediumTOKYO ELECTRON LTD·Filed 2016·Granted Mar 28, 2017·2 cites·10 claims
- 0568US10460946B2Naturally oxidized film removing method and naturally oxidized film removing deviceTOKYO ELECTRON LTD·Filed 2016·Granted Oct 29, 2019·1 cites·8 claims
- 0665US10312079B2Etching methodTOKYO ELECTRON LTD·Filed 2015·Granted Jun 4, 2019·1 cites·6 claims
- 0756US2004234663A1Bread-making additive and bread-making compositionNISSHIN SEIFUN GROUP INC·Filed 2004·Application pending·0 cites
- 0852US7550739B2Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrateTOKYO ELECTRON LTD·Filed 2006·Granted Jun 23, 2009·0 cites·19 claims
- 0951US2009008579A1Electron beam lithography apparatus and design method of patterned beam-defining apertureTOKYO ELECTRON LTD·Filed 2008·Application pending·0 cites
- 1044US10734242B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Aug 4, 2020·0 cites·5 claims
- 1144US5262182ABreadmaking dough conditionerNISSHIN FLOUR MILLING CO·Filed 1992·Granted Nov 16, 1993·16 cites·5 claims
- 1244US2022068657A1Etching method and etching apparatusTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1341US2019181056A1Silicon-containing film etching method, computer-readable storage medium, and silicon-containing film etching apparatusTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
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