Inventor · disambiguated record
William C. Allison
Also filed as: ALLISON WILLIAM · ALLISON WILLIAM C · ALLISON WILLIAM CHARLES
36 granted patents·16 pending applications·474 citations·filing 1990–2017
97Inventor score
Top patents by PatentIndex Score
52 records- 0197US9296085B2Polishing pad with homogeneous body having discrete protrusions thereonBAJAJ RAJEEV·Filed 2014·Granted Mar 29, 2016·32 cites·16 claims
- 0297US9211628B2Polishing pad with concentric or approximately concentric polygon groove patternALLISON WILLIAM C·Filed 2011·Granted Dec 15, 2015·21 cites·19 claims
- 0397US9067297B2Polishing pad with foundation layer and polishing surface layerALLISON WILLIAM C·Filed 2011·Granted Jun 30, 2015·31 cites·82 claims
- 0496US9017140B2CMP pad with local area transparencyALLISON WILLIAM·Filed 2010·Granted Apr 28, 2015·43 cites·13 claims
- 0596US8968058B2Polishing pad with alignment featureKERPRICH ROBERT·Filed 2011·Granted Mar 3, 2015·20 cites·16 claims
- 0696US8702479B2Polishing pad with multi-modal distribution of pore diametersHUANG PING·Filed 2010·Granted Apr 22, 2014·30 cites·42 claims
- 0795US9156124B2Soft polishing pad for polishing a semiconductor substrateALLISON WILLIAM·Filed 2010·Granted Oct 13, 2015·38 cites·28 claims
- 0895US9067298B2Polishing pad with grooved foundation layer and polishing surface layerLEFEVRE PAUL ANDRE·Filed 2011·Granted Jun 30, 2015·21 cites·28 claims
- 0994US8920219B2Polishing pad with alignment apertureALLISON WILLIAM C·Filed 2011·Granted Dec 30, 2014·13 cites·17 claims
- 1094US7291063B2Polyurethane urea polishing padPPG IND OHIO INC·Filed 2006·Granted Nov 6, 2007·29 cites·14 claims
- 1191US9649742B2Polishing pad having polishing surface with continuous protrusionsNEXPLANAR CORP·Filed 2013·Granted May 16, 2017·13 cites·22 claims
- 1288US9868185B2Polishing pad with foundation layer and window attached theretoCABOT MICROELECTRONICS CORP·Filed 2015·Granted Jan 16, 2018·3 cites·28 claims
- 1388US8439994B2Method of fabricating a polishing pad with an end-point detection region for eddy current end-point detectionALLISON WILLIAM C·Filed 2010·Granted May 14, 2013·8 cites·24 claims
- 1486US6905402B2Polishing pad for planarizationPPG IND OHIO INC·Filed 2003·Granted Jun 14, 2005·33 cites·69 claims
- 1585US9238294B2Polishing pad having porogens with liquid fillerLEFEVRE PAUL ANDRE·Filed 2014·Granted Jan 19, 2016·5 cites·65 claims
- 1682US10160092B2Polishing pad having polishing surface with continuous protrusions having tapered sidewallsNEXPLANAR CORP·Filed 2013·Granted Dec 25, 2018·5 cites·37 claims
- 1782US5880196AInkjet printing mediaPPG INDUSTRIES INC·Filed 1997·Granted Mar 9, 1999·36 cites·28 claims
- 1879US8628384B2Polishing pad for eddy current end-point detectionALLISON WILLIAM C·Filed 2010·Granted Jan 14, 2014·3 cites·11 claims
- 1973US6340725B1Inkjet printing mediaHEWLETT PACKARD CO·Filed 1999·Granted Jan 22, 2002·20 cites·15 claims
- 2069US9597769B2Polishing pad with polishing surface layer having an aperture or opening above a transparent foundation layerLEFEVRE PAUL ANDRE·Filed 2012·Granted Mar 21, 2017·2 cites·59 claims
- 2168US7097549B2Polishing padPPG IND OHIO INC·Filed 2002·Granted Aug 29, 2006·9 cites·28 claims
- 2268US6074761AInkjet printing mediaPPG IND OHIO INC·Filed 1997·Granted Jun 13, 2000·16 cites·13 claims
- 2366US8657653B2Homogeneous polishing pad for eddy current end-point detectionALLISON WILLIAM C·Filed 2010·Granted Feb 25, 2014·1 cites·12 claims
- 2462US9597770B2Method of fabricating a polishingNEXPLANAR CORP·Filed 2014·Granted Mar 21, 2017·0 cites·12 claims
- 2562US9028302B2Polishing pad for eddy current end-point detectionALLISON WILLIAM C·Filed 2013·Granted May 12, 2015·0 cites·10 claims
- 2661US9931728B2Polishing pad with foundation layer and polishing surface layerNEXPLANAR CORP·Filed 2015·Granted Apr 3, 2018·0 cites·23 claims
- 2761US2008139684A1Process for preparing a polyurethane urea polishing padPPG IND OHIO INC·Filed 2008·Application pending·0 cites
- 2860US9931729B2Polishing pad with grooved foundation layer and polishing surface layerNEXPLANAR CORP·Filed 2015·Granted Apr 3, 2018·0 cites·23 claims
- 2960US5948396AHair fixative amphoteric polymer compositionPPG IND OHIO INC·Filed 1997·Granted Sep 7, 1999·21 cites·21 claims
- 3059US9249273B2Polishing pad with alignment featureKERPRICH ROBERT·Filed 2015·Granted Feb 2, 2016·0 cites·17 claims
- 3159US2015273656A1Polishing pad with foundation layer and polishing surface layerALLISON WILLIAM C·Filed 2015·Application pending·0 cites
- 3258US9597777B2Homogeneous polishing pad for eddy current end-point detectionNEXPLANAR CORP·Filed 2014·Granted Mar 21, 2017·0 cites·6 claims
- 3358US2016023322A1Polishing pad with concentric or approximately concentric polygon groove patternALLISON WILLIAM C·Filed 2015·Application pending·0 cites
- 3457US9555518B2Polishing pad with multi-modal distribution of pore diametersNEXPLANAR CORP·Filed 2014·Granted Jan 31, 2017·0 cites·13 claims
- 3554US10946495B2Low density polishing padNEXPLANAR CORP·Filed 2015·Granted Mar 16, 2021·0 cites·11 claims
- 3654US2009094900A1Method of forming a polyurea polyurethane elastomer containing chemical mechanical polishing padPPG IND OHIO INC·Filed 2008·Application pending·0 cites
- 3752US10293459B2Polishing pad having polishing surface with continuous protrusionsNEXPLANAR CORP·Filed 2017·Granted May 21, 2019·0 cites·23 claims
- 3852US2006183412A1Polishing padALLISON WILLIAM C·Filed 2006·Application pending·0 cites
- 3952US2012302148A1Polishing pad with homogeneous body having discrete protrusions thereonBAJAJ RAJEEV·Filed 2011·Application pending·0 cites
- 4049US2007021045A1Polyurethane Urea Polishing Pad with WindowPPG IND OHIO INC·Filed 2006·Application pending·0 cites
- 4147US2015038066A1Low density polishing padNEXPLANAR CORP·Filed 2013·Application pending·0 cites
- 4246US5075042ASurfactant blend containing an alkyl poly(ethyleneoxy)sulfonate to reduce dermal irritationPPG INDUSTRIES INC·Filed 1990·Granted Dec 24, 1991·11 cites·10 claims
- 4346US2009047884A1Chemical mechanical polishing pad structure minimizing trapped air and polishing fluid intrusionPPG IND OHIO INC·Filed 2007·Application pending·0 cites
- 4445US9333577B2Electro discharge machining apparatus and methodLI PENG·Filed 2008·Granted May 10, 2016·0 cites·15 claims
- 4545US2015343595A1Soft polishing pad for polishing a semiconductor substrateALLISON WILLIAM C·Filed 2015·Application pending·0 cites
- 4644US2007010169A1Polishing pad with window for planarizationPPG IND OHIO INC·Filed 2006·Application pending·0 cites
- 4742US2006089094A1Polyurethane urea polishing padSWISHER ROBERT G·Filed 2004·Application pending·0 cites
- 4842US2006089093A1Polyurethane urea polishing padSWISHER ROBERT G·Filed 2004·Application pending·0 cites
- 4942US2006089095A1Polyurethane urea polishing padSWISHER ROBERT G·Filed 2004·Application pending·0 cites
- 5040US6228822B1Synthetic detergent base material and synthetic detergent bar produced therefromBASF CORP·Filed 1995·Granted May 8, 2001·10 cites·18 claims
Showing the top 50 of 52 patent records by PatentIndex Score.
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