Inventor · disambiguated record
Michael Edley
Also filed as: EDLEY MICHAEL
1 granted patent·2 pending applications·0 citations·filing 2021–2022
14Inventor score
Files withTOKYO ELECTRON LTD3
Top patents by PatentIndex Score
3 records- 0164US11289325B2Radiation of substrates during processing and systems thereofTOKYO ELECTRON LTD·Filed 2021·Granted Mar 29, 2022·0 cites·16 claims
- 0261US2022189764A1Radiation of Substrates During Processing and Systems ThereofTOKYO ELECTRON LTD·Filed 2022·Application pending·0 cites
- 0342US2021265205A1Dielectric etch stop layer for reactive ion etch (rie) lag reduction and chamfer corner protectionTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →