Inventor · disambiguated record
Daniel J. Vestyck
Also filed as: VESTYCK DANIEL · VESTYCK DANIEL J · VESTYCK JR DANIEL J
11 granted patents·5 pending applications·353 citations·filing 1998–2013
92Inventor score
Top patents by PatentIndex Score
16 records- 0195US9139425B2Process for manufacturing electro-mechanical systemsVESTYCK DANIEL J·Filed 2010·Granted Sep 22, 2015·94 cites·13 claims
- 0293US6100200ASputtering process for the conformal deposition of a metallization or insulating layerADVANCED TECH MATERIALS·Filed 1998·Granted Aug 8, 2000·133 cites·50 claims
- 0390US6316797B1Scalable lead zirconium titanate(PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film materialADVANCED TECH MATERIALS·Filed 1999·Granted Nov 13, 2001·67 cites·37 claims
- 0489US7344589B2Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film materialADVANCED TECH MATERIALS·Filed 2006·Granted Mar 18, 2008·9 cites·13 claims
- 0586US7705382B2Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film materialADVANCED TECH MATERIALS·Filed 2007·Granted Apr 27, 2010·6 cites·25 claims
- 0682US7862857B2Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film materialADVANCED TECH MATERIALS·Filed 2010·Granted Jan 4, 2011·3 cites·20 claims
- 0780US6984417B2Scalable lead zirconium titanate (PZT) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film materialADVANCED TECH MATERIALS·Filed 2001·Granted Jan 10, 2006·15 cites·27 claims
- 0878US7022864B2Ethyleneoxide-silane and bridged silane precursors for forming low k filmsADVANCED TECH MATERIALS·Filed 2003·Granted Apr 4, 2006·12 cites·29 claims
- 0963US2008048148A1Ethyleneoxide-silane and bridged silane precursors for forming low k filmsADVANCED TECH MATERIALS·Filed 2007·Application pending·0 cites
- 1058US2013324390A1Scalable lead zirconium titanate (pzt) thin film material and deposition method, and ferroelectric memory device structures comprising such thin film materialADVANCED TECH MATERIALS·Filed 2013·Application pending·0 cites
- 1151US7012292B1Oxidative top electrode deposition process, and microelectronic device structureADVANCED TECH MATERIALS·Filed 1998·Granted Mar 14, 2006·11 cites·12 claims
- 1249US2006134897A1Ethyleneoxide-silane and bridged silane precursors for forming low k filmsBOROVIK ALEXANDER S·Filed 2005·Application pending·0 cites
- 1343US2006108623A1Oxidative top electrode deposition process, and microelectronic device structureBUSKIRK PETER C V·Filed 2005·Application pending·0 cites
- 1438US10161567B2Process chamber pressure control system and methodVESTYCK DANIEL J·Filed 2010·Granted Dec 25, 2018·0 cites·15 claims
- 1533US2010230266A1Configurable Electrical Outlet ReceptacleVESTYCK DANIEL J·Filed 2010·Application pending·0 cites
- 1630US6157133AMetal oxide discharge lampUS NAVY·Filed 1998·Granted Dec 5, 2000·3 cites·23 claims
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